Sub-nanometre quality X-ray mirrors created using ion beam figuring.

Ion beam figuring (IBF) is a powerful technique for figure correction of X-ray mirrors to a high accuracy. Here, recent technical advancements in the IBF instrument developed at Diamond Light Source are presented and experimental results for figuring of X-ray mirrors are given. The IBF system is equipped with a stable DC gridded ion source (120 mm diameter), a four-axis motion stage to manipulate the optic, a Faraday cup to monitor the ion-beam current, and a camera for alignment. A novel laser speckle angular measurement instrument also provides on-board metrology. To demonstrate the IBF system's capabilities, two silicon X-ray mirrors were processed. For 1D correction, a height error of 0.08 nm r.m.s. and a slope error of 44 nrad r.m.s. were achieved. For 2D correction over a 67 mm × 17 mm clear aperture, a height error of 0.8 nm r.m.s. and a slope error of 230 nrad r.m.s. were obtained. For the 1D case, this optical quality is comparable with the highest-grade, commercially available, X-ray optics.

Ion beam figuring for X-ray mirrors: history, state-of-the-art and future prospects.

Synchrotron light sources require X-ray optics with extremely demanding accuracy for the surface profile, with less than 100 nrad slope errors and sub-nanometre height errors. Such errors are challenging to achieve for aspheres using traditional polishing methods. However, post-polishing error correction can be performed using techniques such as ion beam figuring (IBF) to improve optics to the desired quality. This work presents a brief overview of the history of IBF, introduces some of the challenges for obtaining such demanding figure errors, and highlights the work done at several in-house IBF facilities at synchrotron light sources worldwide to obtain state-of-the-art optical quality.

Sub-nanograin metal based high efficiency multilayer reflective optics for high energies.

The present finding illuminates the physics of the formation of interfaces of metal based hetero-structures near layer continuous limit as an approach to develop high-efficiency W/B4C multilayer (ML) optics with ML periodicity varying d = 1.86-1.23 nm at a fixed number of layer pairs N = 400. The microstructure of metal layers is tailored near the onset of grain growth to control the surface density of grains resulting in small average sizes of grains to sub-nanometers. This generates concurrently desirable atomically sharp interfaces, high optical contrast, and desirable stress properties over a large number of periods, which have evidence through the developed ML optics. We demonstrate significantly high reflectivities of ML optics measured in the energy range 10-20 keV, except for d = 1.23 nm due to quasi-continuous layers. The reflectivities at soft gamma-rays are predicted.