High-Throughput Industrial Coatings Research at The Dow Chemical Company.

At The Dow Chemical Company, high-throughput research is an active area for developing new industrial coatings products. Using the principles of automation (i.e., using robotic instruments), parallel processing (i.e., prepare, process, and evaluate samples in parallel), and miniaturization (i.e., reduce sample size), high-throughput tools for synthesizing, formulating, and applying coating compositions have been developed at Dow. In addition, high-throughput workflows for measuring various coating properties, such as cure speed, hardness development, scratch resistance, impact toughness, resin compatibility, pot-life, surface defects, among others have also been developed in-house. These workflows correlate well with the traditional coatings tests, but they do not necessarily mimic those tests. The use of such high-throughput workflows in combination with smart experimental designs allows accelerated discovery and commercialization.

An engineered anisotropic nanofilm with unidirectional wetting properties.

Anisotropic textured surfaces allow water striders to walk on water, butterflies to shed water from their wings and plants to trap insects and pollen. Capturing these natural features in biomimetic surfaces is an active area of research. Here, we report an engineered nanofilm, composed of an array of poly(p-xylylene) nanorods, which demonstrates anisotropic wetting behaviour by means of a pin-release droplet ratchet mechanism. Droplet retention forces in the pin and release directions differ by up to 80 µN, which is over ten times greater than the values reported for other engineered anisotropic surfaces. The nanofilm provides a microscale smooth surface on which to transport microlitre droplets, and is also relatively easy to synthesize by a bottom-up vapour-phase technique. An accompanying comprehensive model successfully describes the film's anisotropic wetting behaviour as a function of measurable film morphology parameters.

Noncovalent mechanism for the conformal metallization of nanostructured parylene films.

We describe a rapid, reliable method of preparing nanoporous Ni or Co films using nanostructured poly(chloro-p-xylylene) (nanoPPX) films as templates. The nanoPPX films are vapor deposited onto Si substrates using oblique angle polymerization (OAP), resulting in the formation of an obliquely aligned PPX nanorod array on the substrate. The nanoPPX films are then subjected to noncovalent functionalization using an aromatic ligand (i.e., pyridine) by means of treatment with either an aqueous solution of the ligand or ligand vapor. The results of quartz crystal microbalance and X-ray diffraction studies support a model in which pyridine adsorption is facilitated by the formation of pi-pi interactions with aromatic moieties in the amorphous surface regions of nanoPPX. The physisorbed pyridine in the nanoPPX film can subsequently bind a catalytic Pd(II)-based colloidal seed layer. Continuous, conformal Ni or Co films, characterized by FIB/SEM and AFM, are grown on the Pd(II)-laden nanoPPX films using electroless metallization. Analogous metallization of a conventionally deposited planar PPX film results in noncontinuous or patchy metal deposits. Such behavior is attributed to the sluggish adsorption of pyridine in the planar PPX film, resulting in an approximately 22-fold decrease in the quantity of pyridine adsorbed compared to that in a nanoPPX film. Consequently, the level of Pd(II) bound by pyridine on a planar PPX film is insufficient to catalyze continuous metallization. Results of a statistical two-level factorial design indicate that the morphology of the metal layer formed on a nanoPPX film is profoundly influenced by the ligand adsorption condition (i.e., aqueous ligand vs ligand vapor treatment) and is correlated to the catalytic activity of Co films for the production of hydrogen from sodium borohydride decomposition.