Photolithographic nanoseeding method for selective synthesis of metal-catalysed nanostructures.

In this work we present a general method for the selective synthesis by photolithography of localised nanostructures in planar geometries. The methodology relies on the previous concept of photo-patternable metallic nanoparticle (NP)/polymer nanocomposites, which can provide a range of NP sizes, polydispersity and densities. First, a photoresist containing metallic ions is patterned by photolithography. Silver NPs are synthesised in situ after the exposure and development of the patterned thin film via the thermal-induced reduction of ions embedded in its structure. Gentle plasma ashing is used to selectively remove the polymer, which leaves NPs on the patterned areas. These NPs are used as seeds for subsequent processes. In order to demonstrate the flexibility of the method, its use to selectively produce localised nanostructures through different processes is shown here. Following a top-down approach, high aspect-ratio silicon nanograss has been produced by reactive ion etching and masking by the NPs. In a bottom-up approach, 280 nm copper clusters have been selectively grown in arrays. This method can be easily extrapolated to other metals and it provides a quick way to selectively generate hierarchical nanostructures in large planar areas that can be used for different applications, such as the fabrication of nanostructured sensor arrays.

High-resolution electron-beam patternable nanocomposite containing metal nanoparticles for plasmonics.

Polymer nanocomposites containing noble metal nanoparticles are promising materials for plasmonic applications. In this paper, we report on a high-resolution negative-tone nanocomposite resist based on poly(vinyl alcohol) where silver nanoparticles and nanopatterns are simultaneously generated by electron-beam lithography. Our results indicate nanostructures with a relatively high concentration of nanoparticles and, consequently, an electromagnetic coupling among the nanoparticles. Therefore, the patternable nanocomposite described in this work may be a suitable material for future plasmonic circuitry.

Fast microscopic method for large scale determination of structure, morphology, and quality of thin colloidal crystals.

We present a novel fast microscopic method to analyze the crystal structures of air-dried or suspended colloidal multilayer systems. Once typical lattice spacings of such films are in the range of visible light, characteristic Bragg scattering patterns are observed. If in microscopic observations these are excluded from image construction, a unique color coding for regions of different structures, morphologies, and layer numbers results. Incoherently scattering defect structures, however, may not be excluded from image construction and thus remain visible with high resolution.