ABSTRACT
Ultrafast laser processing of bulk transparent materials can significantly gain flexibility when the number of machining spots is increased. We present a photoinscription regime in which an array of regular dots is generated before the region of main laser focus under single-pulse exposure in fused silica and borosilicate crown glass without any external spatial phase modulation. The specific position of the dots does not rely on nonlinear propagation effects but is mainly determined by beam truncation and is explained by a Fresnel propagation formalism taking into account beam apodization and linear wavefront distortions at the air/glass interface. The photoinscription regime is employed to generate a two-dimensional array of dots in fused silica. We show that an additional phase modulation renders flexible the pattern geometry.
ABSTRACT
Laser-induced self-organization of regular nanoscale layered patterns in fused silica is investigated using spectroscopy and microscopy methods, revealing a high presence of stable broken oxygen bonds. Longitudinal traces are then generated by replicating static irradiation structures where the nanoscale modulation can cover partially or completely the photoinscribed traces. The resulting birefringence, the observed anisotropic light scattering properties, and the capacity to write and erase modulated patterns can be used in designing bulk polarization sensitive devices. Various laser-induced structures with optical properties combining guiding, scattering, and polarization sensitivity are reported. The attached polarization functions were evaluated as a function of the fill factor of the nanostructured domains. The polarization sensitivity allows particular light propagation and confinement properties in three dimensional structures.
ABSTRACT
Laser writing of longitudinal waveguides in bulk transparent materials degrades with the focusing depth due to wavefront distortions generated at the air-dielectric interface. Using adaptive spatial tailoring of ultrashort laser pulses, we show that spherical aberrations can be dynamically compensated in optical glasses, in synchronization with the writing procedure. Aberration-free structures can thus be induced at different depths, showing higher flexibility for 3D processing. This enables optimal writing of homogeneous longitudinal waveguides over more significant lengths. The corrective process becomes increasingly important when laser energy has to be transported without losses at arbitrary depths, with the purpose of triggering mechanisms of positive refractive index change.
Subject(s)
Computer-Aided Design , Glass/chemistry , Glass/radiation effects , Lasers , Lenses , Models, Theoretical , Refractometry/instrumentation , Computer Simulation , Equipment Design , Equipment Failure Analysis , Surface PropertiesABSTRACT
We propose a comprehensive analysis of the effects that spherical aberration may have on the process of ultrafast laser photowriting in bulk transparent materials and discuss the consequences for the generated refractive index changes. Practical aspects for a longitudinal photowriting configuration are emphasized. Laser-induced index variation in BK7 optical glass and fused silica (a-SiO(2)) affected by spherical aberration are characterized experimentally using phase-contrast optical microscopy. Experimental data are matched by analytical equations describing light propagation through dielectric interfaces. Corrective solutions are proposed with a particular focus on the spatial resolution achievable and on the conditions to obtain homogeneously photo-induced waveguides in a longitudinal writing configuration.
