ABSTRACT
Using low-energy electron diffraction and angle-resolved photoemission spectroscopy, we investigated the lattice and electronic structures of the Pb(111) surface upon the adsorption of Au atoms at the low temperature T = 40 K. Unlike earlier results showing the formation of PbAu-alloy layers at room temperature, we found that Au atoms form a ultra-thin superstructure, Au/Pb(111)-3 × 3, on top of the Pb(111) surface. Moreover, three surface-state bands, S1, S2, and S3, are induced within and immediately adjacent to the Pb bulk projected band gap centered at the surface zone boundary [Formula: see text] at the energies of - 0.02, - 1.05, and - 2.56 eV, respectively. First-principles calculation based on Au/Pb(111)-3 × 3 confirms the measured surface-state bands among which the most interesting are the S1 and S3 surface states. They are derived from surface resonances in Pb(111). Moreover, S1, which disperses across Fermi level, exhibits a large anisotropic Rashba splitting with α of 1.0 and 3.54 eVÅ in the two symmetry directions centered at [Formula: see text]. The corresponding Rashba splitting of S1 band in Cu/Pb(111)-3 × 3 and Ag/Pb(111)-3 × 3 were calculated for comparison.
ABSTRACT
The non-uniform intensity profile of Gaussian-like laser beams used in interference lithography (IL) leads to a non-uniform dose and feature size distribution across the sample. Previously described methods to improve dose uniformity are reviewed. However, here we examine the behavior of the non-uniformity from the viewpoint of photoresist response rather than the IL system configuration. Samples with a fixed intra-sample dose profile were exposed with an increasing average dose. A line/space pattern with a period of 240 nm across an area of 2 × 2 cm(2) was produced using IL on identical samples using a HeCd laser operated at 325 nm and a Lloyd's mirror IL system. A binary model of photoresist response predicts that the absolute range of line widths in nanometers should be significantly reduced as the overall sample dose is increased. We have experimentally verified a reduction in the range of line widths within a given sample from 50 to 16 nm as the overall dose is increased by only 60%. This resulted in a drop in the narrowest line width from 120 to 65 nm. An etch process is demonstrated to increase the line width by generating a wider secondary chrome hard mask from the narrowly patterned primary chrome hard mask. The subsequent fabrication of a silicon nanoimprint mold is used as a demonstration of the technique.
