Nanoporous antireflection coating for high-temperature applications in the infrared.

Antireflection (AR) coatings are essential to the performance of optical systems; without them, surface reflections increase significantly at steep angles and become detrimental to the functionality. AR coatings apply to a wide range of applications from solar cells and laser optics to optical windows. Many times, operational conditions include high temperatures and steep angles of incidence (AOIs). The implementation of AR coatings is extremely challenging in these conditions. Nanoporous coatings made from high-temperature-tolerant materials offer a solution to this problem. The careful selection of materials is needed to prevent delamination when exposed to high temperatures, and an optimal optical design is needed to lower surface reflections at both the normal incidence and steep AOIs. This paper presents nanoporous silicon dioxide and hafnium dioxide coatings deposited on a sapphire substrate using oblique angle deposition by electron beam evaporation, a highly accurate deposition technique for thin films. Developed coatings were tested in a controlled temperature environment and demonstrated thermal stability at temperatures up to 800°C. Additional testing at room temperature demonstrated the reduction of power reflections near optimal for AOIs up to 70° for a design wavelength of 1550 nm. These findings are promising to help extend the operation of technology at extreme temperatures and steep angles.

Experimental characterization and physics-based modeling of the temperature-dependent diffuse reflectance of plasma-sprayed Nd2Zr2O7 in the near to short-wave infrared.

Supercontinuum-laser illumination in conjunction with CO2-laser heating has been implemented to measure the near to short-wave infrared (970-1660 nm) diffuse reflectance of plasma-sprayed Nd2Zr2O7 as a function of temperature. Owing to the broadband nature of this experimental technique, the diffuse reflectance of plasma-sprayed Nd2Zr2O7 has been measured at many wavelengths and has been shown to decrease with increasing temperature. A physics-based model for diffuse reflectance predicated on the crystal/electronic band structure of highly scattering semiconductor materials has been constructed to interpret the results of these measurements. Baseline materials characterization has also been performed to assist in the development of crystal/electronic band structure-optical property relationships that could be useful for the design of next-generation environmental barrier coatings. This characterization has included ambient and non-ambient x-ray diffraction as well as room-temperature, integrating-sphere diffuse reflectance spectroscopy.