Optical filter wavefront distortion: out-of-band to in-band predictions and the effect of the illumination source bandwidth.

The wavefront distortion (WFD) of a surface with an optical filter coating is ideally measured at the operating wavelength (λ) and angle of incidence (θ) of the filter. However, this is not always possible, requiring that the filter be measured at an out-of-band wavelength and angle (typically λ=633n m and θ=0∘). Since the transmitted wavefront error (TWE) and reflected wavefront error (RWE) can depend on the measurement wavelength and angle, an out-of-band measurement may not give an accurate characterization of the WFD. In this paper, we will show how to predict the wavefront error (WFE) of an optical filter at the in-band wavelength and angle from a WFE measurement at an out-of-band wavelength and different angle. This method uses (i) the theoretical phase properties of the optical coating, (ii) the measured filter thickness uniformity, and (iii) the substrate's WFE dependence versus the angle of incidence. Reasonably good agreement was achieved between the RWE measured directly at λ=1050n m (θ=45∘) and the predicted RWE based on an RWE measurement at λ=660n m (θ=0∘). It is also shown through a series of TWE measurements using a light emitting diode (LED) and laser light sources that, if the TWE of a narrow bandpass filter (e.g., an 11 nm bandwidth centered at λ=1050n m) is measured with a broadband LED source, the WFD can be dominated by the chromatic aberration of the wavefront measuring system-hence, a light source that has a bandwidth narrower than the optical filter bandwidth should be used.

Effect of an optical coating on in-band and out-of-band transmitted and reflected wavefront error measurements.

The wavefront error (WE) of a surface with an optical coating ("filter") is ideally measured at the in-band wavelength of the filter. However, quite often this is not possible, requiring that the filter be measured at an out-of-band wavelength (typically 633 nm), assuming that the filter transmits (for transmitted WE, or TWE) or reflects (for reflected WE, or RWE) at this wavelength. This out-of-band TWE/RWE is generally assumed to provide a good estimation of the desired in-band TWE/RWE. It will be shown in this paper that this is not the case for a large class of filters (i.e., bandpass) where the group delay is significantly different at the in-band and out-of-band wavelengths and where the optical filter exhibits a thickness non-uniformity across the surface. A theoretical explanation will be given along with an approach to predict the in-band TWE/RWE based on the coating non-uniformity, the measured out-of-band TWE/RWE, and the theoretical properties of the optical filter at the in-band and out-of-band wavelengths. A reasonable agreement between theory and measurement was demonstrated by measuring the TWE of an 11 nm wide bandpass filter (centered at 1048 nm) at both in-band (λ=1048nm) and out-of-band (λ=625nm) wavelengths. A similar treatment is provided for RWE.

Characterization of thin-film losses with a synchronously pumped ringdown cavity.

We describe the use of a synchronously pumped ringdown cavity for measuring total optical losses, absorption and scattering, in thin optical films of arbitrary thickness on transparent substrates. This technique is compared with a single-pulse ringdown cavity regime and is shown to have a superior signal-to-noise ratio and resolution. We also provide an analysis of the factors affecting the resolution of the technique. Using this ringdown cavity pumped by a conventional mode-locked Ti:sapphire laser, we experimentally detect losses of only 58 +/- 9 and 112 +/- 9 parts per million in Ta2O5 and SiO2 films, respectively. To our knowledge, these are so far the lowest losses measured in thin films on stand-alone transparent substrates.

Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.

We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within +/-0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions.

Performance of normal-incidence molybdenum-yttrium multilayer-coated diffraction grating at a wavelength of 9 nm.

The first experimental investigation of a normal-incidence Mo-Y multilayer-coated diffraction grating operating at a 9-nm wavelength is reported. The substrate is a replica of a concave holographic ion-etched blazed grating with 2,400 grooves/mm and a 2-m radius of curvature. The measured peak efficiency in the -3 order is 2.7% at a wavelength of 8.79 nm. To our knowledge, this is the highest normal-incidence grating efficiency ever obtained in this wavelength region.