ABSTRACT
A novel fabrication method for a two-dimensional photonic crystal color filter based on guided mode resonance is proposed. An amorphous silicon layer deposited through the low-temperature plasma enhanced chemical vapor deposition (PECVD) process is patterned into two-dimensional structures using low-cost nanoimprint lithography. It is then effectively crystallized using multi-shot excimer laser annealing at low energy. We have demonstrated analytically and experimentally that single crystal-like silicon patterns on a glass substrate can offer high-efficiency photonic crystal color filters for reflective display applications. The highly crystallized silicon patterning scheme presented here may be very attractive for a variety of devices requiring high carrier mobility and high optical efficiency.
ABSTRACT
A novel concept for reflective displays that uses two-dimensional photonic crystals with subwavelength gratings is introduced. A solar-powered reflective display with photonic crystal color filters was analyzed by a theoretical approach. We fabricated the photonic crystal color filters on a glass substrate by using low-cost nanoimprint lithography and multi-scan excimer laser annealing to produce RGB color filters through a single patterning process. The theoretical and experimental results show that the color filters have high reflectance and angular tolerance, which was qualitatively confirmed by chromaticity coordination analysis.
