Electron beam lithography with negative tone resist for highly integrated silicon quantum bits.

Process technologies have been developed for electron-beam (EB) lithography aimed at silicon quantum devices and their large-scale integration. It is necessary to understand the proximity effect and construct a method for its correction to perform EB lithography of fine and complicated structures. In this study, we investigate the lithography of Si quantum devices with a point-beam EB system and a maN 2401 negative tone resist, in order to correspond to various types of device structures. We optimize temperatures for specialized pre- and post-exposure bakes for forming âˆ¼20 nm fine patterns with small line-edge roughness. Further, we demonstrated the fabrication of Si-on-insulator device patterns that have some tiny dots connected with many large wires/pads in the layout, with the careful tuning of the dose assignment. In this tuning, we used the EB process simulation to estimate the cumulative dose distribution effectively. In addition, we reproduced the experimentally obtained resist patterns via the EB process simulation after considering the mid-range effect, which is a factors in the proximity effect but is not yet deeply understood. The results of this study are expected to provide useful process technologies for EB lithography, which will help drastically accelerate the research on Si quantum devices with a high degree of freedom.

Conductance Tunable Suspended Graphene Nanomesh by Helium Ion Beam Milling.

This paper demonstrates that the electrical properties of suspended graphene nanomesh (GNM) can be tuned by systematically changing the porosity with helium ion beam milling (HIBM). The porosity of the GNM is well-controlled by defining the pitch of the periodic nanopores. The defective region surrounding the individual nanopores after HIBM, which limits the minimum pitch achievable between nanopores for a certain dose, is investigated and reported. The exponential relationship between the thermal activation energy (EA) and the porosity is found in the GNM devices. Good EA tuneability observed from the GNMs provides a new approach to the transport gap engineering beyond the conventional nanoribbon method.