A Single-Step Bottom-up Approach for Synthesis of Highly Uniform Mie-Resonant Crystalline Semiconductor Particles at Visible Wavelengths.

Optically Mie-resonant crystalline silicon nanoparticles have long attracted interest for their unique scattering behaviors. Here, we report a bottom-up nonthermal plasma process that produces highly monodisperse particles, with diameters controllable between 60 and 214 nm, by temporarily electrostatically trapping nanoparticles inside a continuous-flow plasma reactor. The particle size is tuned by adjusting the gas residence time in the reactor. By dispersing the nanoparticles in water, optical extinction measurements indicate colloidal solutions of a particle-based metafluid in which particles support both strong magnetic and electric dipole resonances at visible wavelengths. The spectral overlap of the electric and magnetic resonances gives rise to directional Kerker scattering. The extinction measurements show excellent agreement with Mie theory, supporting the idea that the fabrication process enables particles with narrow distributions in size, shape, and composition. This single-step gas-phase process can also produce Mie-resonant nanoparticles of dielectric materials other than silicon and directly deposit them on the desired substrates.

Broadband, Angle- and Polarization-Invariant Antireflective and Absorbing Films by a Scalable Synthesis of Monodisperse Silicon Nanoparticles.

Optically induced magnetic resonances (OMRs) are highly tunable scattering states that cannot be reproduced in systems that only support electric resonances, such as in metals, lossy, or low-index materials. Despite offering unique scattering and coupling behavior, the study of OMRs in thin films has been limited by synthesis and simulation constraints. We report on the absorption and scattering response of OMR-based thin films composed of monodisperse crystalline silicon nanoparticles synthesized using a scalable nonthermal plasma growth technique and tractable simulation framework. The synthesis is solvent and ligand free, ensuring minimal contamination, and crystalline particles form with high yield and a narrow size distribution at close to room temperature. Using a scalable high-throughput deposition method, we deposit random particle films, without the need of a solid host matrix, showing near complete blackbody absorption at the collective OMR. This is achieved using 70% less material than an optimized antireflective-coated crystalline silicon thin film. The film exhibits strongly directional forward scattering with very low reflectivity, thus giving rise to angle- and polarization-insensitive antireflection properties across the visible spectrum. We find that, while commonly used effective medium models cannot capture the optical response, a modified effective medium accounting for multipole resonances and interparticle coupling shows excellent agreement with experiment. The effective permittivity and permeability are written in a mode and cluster resolved form, providing useful insight into how individual resonances and nanoparticle clusters affect the overall film response. Electric and magnetic-mode coupling show dramatically different behavior, resulting in uniquely different spectral broadening.

High-Precision Solvent Vapor Annealing for Block Copolymer Thin Films.

Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple parameters play in solvent vapor annealing has not been fully established. In solvent vapor annealing a thin polymer film is exposed to a vapor of solvent(s) thus forming a swollen and mobile layer to direct the self-assembly process at the nanoscale. Recent developments in both theory and experiments have directly identified critical parameters that govern this process, but controlling them in any systematic way has proven non-trivial. These identified parameters include vapor pressure, solvent concentration in the film, and the solvent evaporation rate. To explore their role, a purpose-built solvent vapor annealing chamber was designed and constructed. The all-metal chamber is designed to be inert to solvent exposure. Computer-controlled, pneumatically actuated valves allow for precision timing in the introduction and withdrawal of solvent vapor from the film. The mass flow controller-regulated inlet, chamber pressure gauges, in situ spectral reflectance-based thickness monitoring, and low flow micrometer relief valve give real-time monitoring and control during the annealing and evaporation phases with unprecedented precision and accuracy. The reliable and repeatable alignment of polylactide cylinders formed from polystyrene-b-polylactide, where cylinders stand perpendicular to the substrate and span the thickness of the film, provides one illustrative example.