Upper hybrid resonance heating experiments by X-mode microwaves on electron cyclotron resonance ion source.

We have considered the accessibility condition of electromagnetic and electrostatic waves propagating in an electron cyclotron resonance (ECR) ion source (ECRIS) plasma and then investigated experimentally their correspondence relationships with production of multicharged ions. It has been clarified that there exists an efficient configuration of ECR zones for producing multicharged ion beams and has been suggested that a new resonance, i.e., upper hybrid resonance (UHR), must have occurred. We have been trying to perform advanced experiments with 4-6 GHz X-mode microwaves to the 2.45 GHz ECRIS plasma, and we have succeeded in enhancing the production of multicharged ions by launching X-mode microwaves of these bands. Furthermore, at the same time, we have observed sharp increases in electron energy distribution functions in the ECRIS plasma by means of probe methods. It has been concluded that the UHRs must have occurred when applying multiplex microwaves with their frequencies away from those frequencies for ECR in the ECRIS. In this paper, we will describe in brief the theoretical background and the results of these new experiments.

First operation and effect of a new tandem-type ion source based on electron cyclotron resonance.

A new tandem type source has been constructed on the basis of electron cyclotron resonance plasma for producing synthesized ion beams in Osaka University. Magnetic field in the first stage consists of all permanent magnets, i.e., cylindrically comb shaped one, and that of the second stage consists of a pair of mirror coil, a supplemental coil and the octupole magnets. Both stage plasmas can be individually operated, and produced ions in which is energy controlled by large bore extractor also can be transported from the first to the second stage. We investigate the basic operation and effects of the tandem type electron cyclotron resonance ion source (ECRIS). Analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas in dual plasmas operation as well as each single operation. We describe construction and initial experimental results of the new tandem type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as this new source can be a universal source in future.

Accessibility condition of wave propagation and multicharged ion production in electron cyclotron resonance ion source plasma.

A new tandem type source of electron cyclotron resonance (ECR) plasmas has been constructing for producing synthesized ion beams in Osaka University. Magnetic mirror field configuration with octupole magnets can be controlled to various shape of ECR zones, namely, in the 2nd stage plasma to be available by a pair mirror and a supplemental coil. Noteworthy correlations between these magnetic configurations and production of multicharged ions are investigated in detail, as well as their optimum conditions. We have been considering accessibility condition of electromagnetic and electrostatic waves propagating in ECR ion source plasma, and then investigated their correspondence relationships with production of multicharged ions. It has been clarified that there exits efficient configuration of ECR zones for producing multicharged ion beams experimentally, and then has been suggested from detail accessibility conditions on the ECR plasma that new resonance, i.e., upper hybrid resonance, must have occurred.

Experimental results of superimposing 9.9 GHz extraordinary mode microwaves on 2.45 GHz ECRIS plasma.

Efficient production of multicharged ions has been investigated on the tandem-type ECRIS in Osaka University. According to the consideration of the accessibility conditions of microwaves to resonance and cutoff regions, it was suggested that the upper hybrid resonance (UHR) heating contributed to enhancement of ion beam intensity. In order to enhance multicharged ion beams efficiently, injecting higher frequency microwave with extraordinary (X-mode) toward UHR region has been tried. In this study, 2.45 GHz frequency microwaves are used for conventional ECR discharge, and 9.9 GHz frequency microwaves with X-mode are superimposed for UHR heating. The effects of additive microwave injection are investigated experimentally in terms of plasma parameters and electron energy distribution function (EEDF) measured by Langmuir probe and ion beam current. As the results show, it is confirmed that the electrons in the high energy region are affected by 9.9 GHz X-mode microwave injection from the detailed analysis of EEDF.

Production of multicharged metal ion beams on the first stage of tandem-type ECRIS.

Multicharged metal ion beams are required to be applied in a wide range of fields. We aim at synthesizing iron-endohedral fullerene by transporting iron ion beams from the first stage into the fullerene plasma in the second stage of the tandem-type electron cyclotron resonance ion source (ECRIS). We developed new evaporators by using a direct ohmic heating method and a radiation heating method from solid state pure metal materials. We investigate their properties in the test chamber and produce iron ions on the first stage of the tandem-type ECRIS. As a result, we were successful in extracting Fe(+) ion beams from the first stage and introducing Fe(+) ion beams to the second stage. We will try synthesizing iron-endohedral fullerene on the tandem-type ECRIS by using these evaporators.

Producing multicharged fullerene ion beam extracted from the second stage of tandem-type ECRIS.

We have been constructing the tandem-type electron cyclotron resonance ion source (ECRIS). Two ion sources of the tandem-type ECRIS are possible to generate plasma individually, and they also confined individual ion species by each different plasma parameter. Hence, it is considered to be suitable for new materials production. As the first step, we try to produce and extract multicharged C60 ions by supplying pure C60 vapor in the second stage plasma because our main target is producing the endohedral fullerenes. We developed a new evaporator to supply fullerene vapor, and we succeeded in observation about multicharged C60 ion beam in tandem-type ECRIS for the first time.

New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams.

A new tandem type source has been constructed on the basis of electron cyclotron resonance (ECR) plasma for producing synthesized ion beams. We investigate feasibility and hope to realize the device which has wide range operation window in a single device to produce many kinds of ion beams based on ECR ion source (ECRIS). It is considered that ECR plasmas are necessary to be available to individual operations with different plasma parameters. Both of analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas. We describe construction of the new tandem type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as this new source can be a universal source.