Lithography-Free Nanofabrication on Various Semiconductors by the Codeposition Etching Technique.

Nano-/microstructures can be formed with the aid of small amounts of impurities during deposition with noble gas plasma irradiation, which is referred to as codeposition etching. This can be a new method for lithography-free semiconductor nanofabrication. Here, the codeposition etching method was employed with argon plasma and molybdenum (Mo) impurities on various semiconductors. Structures can be formed only on substrates that have a lower sputtering yield than the seed impurity. The density, area, and height of structures are related to both the impurity deposition rate and the substrate material. Moreover, two mechanisms of impurity nucleation are proposed according to time dependence results for the formation of the structures.

Four-dimensional conditional averaging tomography of rotating plasma ejection from cylindrical detached plasma.

Detached plasma formation is a way to reduce the heat load on the wall in magnetic fusion devices. This study proposes a novel analysis technique consisting of the conditional averaging, sliding window, and tomography to reveal the spatiotemporal behavior of the rotating radial ejection event of detached plasma, which further contributes to local heat load reduction. The used equipment is a high-speed camera and an electrostatic probe located at the periphery of the linear plasma device NAGDIS-II. By applying this method, four-dimensional (4D) behavior of the emission structure along time (1D) and space perpendicular and parallel to the magnetic field (3D) was clarified; a rotating distorted structure appears as a precursor, which is then scraped and transported radially and axially. The proposed method is widely applicable to short-term rigid-body rotating structures, especially in linear plasmas.

Fabrication of tungsten-based optical diffuser using fiberform nanostructure via efficient plasma route.

Optical diffusion is an essential process used to manage photons in a wide range of photoelectric systems. This work proposes an approach to fabricate novel optical diffusers by a plasma-processing technique, using fiberform nanostructures formed by helium plasma irradiation and subsequent annealing. After an annealing procedure in the air for oxidation, the optical properties and the light-diffusing abilities of these nanostructured thin films were studied. In addition to the morphology analysis and total transmittance measurement, the diffusion efficiency of the optical diffusers was analyzed using a transmitted scatter distribution function (TDF). It was revealed that the diffusion efficiency of a device with an irradiation time of 30 minutes could reach 97%. The results demonstrate the potential of these nanostructured optical diffusers for various photoelectric applications.

Growth origin of large-scale fiberform nanostructures in He-W co-deposition environment.

When tungsten (W) is deposited with helium (He) plasma (He-W co-deposition) on W surface, enhanced growth of fiberform nanostructure (fuzz) occurs, and sometimes it grows into large-scale fuzzy nanostructures (LFNs) thicker than 0.1 mm. In this study, different numbers of mesh opening (apertures) and W plates with nanotendril bundles (NTBs), which are tens of micrometers high nanofiber bundles, were used to investigate the condition for the origin of the LFN growth. It was found that the larger the mesh opening, the larger the area where LFNs are formed and the faster the formation tends to be. On NTB samples, it was found that NTBs grew significantly when exposed to He plasma with W deposition, especially when the size of the NTB reached [Formula: see text] mm. The concentration of the He flux due to the distortion of the shape of the ion sheath is proposed as one of the reasons to explain the experimental results.

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process.

We consider the corona model and local thermal equilibrium approximations of a real plasma to measure the electron temperature (Te) and density (ne), respectively, using the optical emission spectroscopy (OES) method in dual-frequency pulsed capacitively coupled plasmas (CCPs) in a reactive mixture of Ar/O2/C4F8 at a low operating pressure. The operation conditions such as DC continuous and synchronized were used for the study and plasma characterization for the intended plasma application such as high aspect ratio etching (HARE). We show that the present plasma conditions are dominated by a corona balance rather than the supremacy of multi-step excitation. This fact has enabled us to utilize the modified Boltzmann plot technique to evaluate the Te values. In the second method, we simultaneously used the Boltzmann and Saha equations to determine the ne value using the line intensity ratio and the value of Te. Time-resolved measurements of Te and ne were performed for completeness, and the insight of the pulsed discharge was investigated. Time evolution of ne and Te using the OES method revealed a similar trend in the change of plasma parameters, indicating electron impact ionization during the pulse on phase. It was seen that ne in the afterglow speedily decreased within a short time of ∼5 µs. Analysis suggests the formation of afterglow plasmas, which are composed of positive and negative ions with very low electron density. The results revealed that the DC-synchronized operation could be useful for plasma application such as HARE due to different plasma characteristics. It also suggests the production of ion-ion plasmas by the effective utilization of negative ions in the afterglow phase. The corona balance condition was validated in our experiments, and the results were compared with the existing literature.

One-Step Plasma Synthesis of Nb2 O5 Nanofibers and their Enhanced Photocatalytic activity.

Fiberform nanostructured niobium (Nb) was fabricated by one step helium (He) plasma irradiation. He ion implantation formed He nano-bubbles on a Nb plate and led to formation of protrusions while migrating in Nb matrix; fiberform nanostructures (FN) were grown when the fluence became high (>1026  m-2 ). The necessary conditions for the formation of Nb FN were revealed to be the surface temperature range of 900-1100 K and the incident ion energy higher than 70 eV. The sample was oxidized at 573-773 K in an air atmosphere, and Pt nanoparticles were photo-deposited on the Nb2 O5 samples. The surface was analyzed by scanning electron microscope, transmission electron microscope, x-ray photoelectron spectroscopy, and ultraviolet-visible spectrophotometry. Photocatalytic activity of the fabricated materials was studied using methylene blue (MB) decolorization process. An enhanced photocatalytic performance was identified on FN Nb2 O5 substrate with Pt deposition.

Enhanced growth of large-scale nanostructures with metallic ion precipitation in helium plasmas.

Helium plasma irradiation on metal surfaces leads to the formation of metallic fuzzy nanostructures accompanied by the growth of helium bubbles in metals. The mechanism of the growth process, its impact for fusion devices, and potential application have been explored. Here we show enhanced growth of large-scale fuzz by precipitating additional metallic particles during helium plasma irradiation. The growth rate of the fuzzy structures became orders of magnitude greater than conventional fuzz growth; in an hour of irradiation, 1 mm-thick visible tungsten and molybdenum fuzzy fur structures covered a tungsten metal substrate. Additional precipitation of metallic ions breaks the bottleneck diffusion process; moreover, further acceleration in the growth rate could have occurred if the electric sheath shape was influenced by the grown structure and the electric field that formed around the structure started collecting ions.

Fuzzy nanostructure growth on Ta/Fe by He plasma irradiation.

In this study, we show from helium (He) plasma irradiation to tantalum and iron surfaces that morphology changes in nanoscale occur on the both metals. In particular, from systematic irradiation experiments, it is identified that fuzzy nanostructures are grown on the both metals. The necessary conditions for the morphology changes are discussed based on the experimental results in terms of the helium migration, the physical sputtering, and the shear modulus of materials. Because oxides or oxinitrides of iron and tantalum are thought of as visible light responsive photocatalytic materials, the present work shows wide potential of usage of plasmas as a tool to tailor photocatalytic materials.

Enhancement of multi-pulse laser induced damage threshold on Cu mirror under vacuum condition.

Multi-pulse laser induced damage threshold (LIDT) for metallic mirrors are important issue for laser diagnostics in future fusion devices. In this paper, the mechanism of multi-pulse LIDT and the influence of the slip formation and oxidization in atmosphere were investigated experimentally with a Nd:YAG pulse laser whose pulse width and wavelength are ~ 5 ns and 1064 nm, respectively. From detailed surface analysis of laser irradiated part by transmission electron microscopy (TEM), it was found that the miniaturization of crystal size and slip formation were observed on damaged area. Oxidization feature was also revealed from the TEM analysis. It was shown that the multi-pulse LIDT could be increased under vacuum condition compared with that in air atmosphere.

Assessment of multi-pulse laser-induced damage threshold of metallic mirrors for Thomson scattering system.

Multi-pulse laser-induced damage threshold (LIDT) was experimentally investigated up to ~10(6) pulses for Cu, Ag mirrors. The surface roughness and the hardness dependence on the LIDT were also examined. The LIDT of OFHC-Cu decreased with the pulse number and was 1.0 J/cm(2) at 1.8 × 10(6) pulses. The expected LIDT of cutting Ag at 10(7) pulses was the highest; Ag mirror would be one of the best choices for ITER Thomson scattering system. For the roughness and hardness, material dependences of LIDT are discussed with experimental results.

Practical selection of emission lines of He I to determine the photon absorption rate.

A combination of helium line intensities and a collisional radiative model has been used to measure electron density and temperature. However, radiation trapping of resonance lines may disturb the measurements due to disturbances in the population distribution of helium atoms. In this study, we show that the principal contribution of radiation trapping in helium plasma can be evaluated by additionally measuring one or two specific line intensities from the singlet state. The inclusion of the effects of radiation trapping sufficiently compensates for anomalous increases in the electron density and temperature, and consequently yields proper values. An experiment was performed in the divertor simulator NAGDIS-II, and the method's validity was confirmed by comparing the spectroscopically obtained results and the values from the electrostatic probe method.