ABSTRACT
A Talbot-Lau interferometer using two-dimensional gratings and a conventional x-ray tube has been used to investigate a phase-contrast imaging technique that is sensitive to phase gradients in two orthogonal directions. Fourier analysis of Moiré fringe patterns was introduced to obtain differential phase images and scattering images from a single exposure. Two-dimensional structures of plastic phantoms and characteristic features of soft tissue were clearly obtained at 17.5 keV. The phase-stepping technique was also examined to investigate the spatial resolution of different phase retrieval methods. In the presented setup we found that the choice of phase retrieval method made little difference in image blur, and a large effective source size was found to give a high intensity in the image plane.
ABSTRACT
We demonstrate a single shot two-dimensional grating-based X-ray phase-contrast imaging using a synchrotron radiation source. A checkerboard designed phase grating for π phase modulation at 17 keV and 35 keV, and a lattice-shaped amplitude grating with a high aspect ratio to shield X-rays up to 35 keV were fabricated. A Fourier analysis of Moiré fringe generated by the gratings was introduced to obtain the two-dimensional differential phase-contrast image with a single exposure. The results show that soft tissues and cartilages of a chicken wing sample are clearly seen with differential phase variation in two-dimensional directions. Using this method not only the whole of an object but also only an inner part of the object can be imaged.
ABSTRACT
Two basic types of interferometer, a point diffraction interferometer (PDI) and a lateral shearing interferometer (LSI) suitable for operation in the extreme-ultraviolet (EUV) wavelength region, are described. To address the challenges of wavefront measurement with an accuracy of 0.1 nm rms, we present a calibration method for the PDI that places a mask with two large windows at the image plane of the illumination point light source and a general approach to deriving the phase-shift algorithm series that eliminates the undesired zeroth-order effect in the LSI. These approaches to improving the measurement accuracy were experimentally verified by the wavefront measurements of a Schwarzschild-type EUV projection lens.
ABSTRACT
In a basic study to identify low-loss optics for applications in F2 lithography, five potential coating materials (AlF3, Na3AlF6, MgF2, LaF8, and GdF3) and three deposition methods (thermal evaporation by a resistance heater and by electron beam and ion-beam sputtering) were investigated in the vacuum ultraviolet (VUV) region. Samples were supplied as single-layer coatings on CaF2 substrates by four Japanese coating suppliers. Refractive indices (n) and extinction coefficients (k) of these coatings at 157 nm were evaluated; the transmittance and the reflectance were measured by a VUV spectrometer and were compared. As a result, resistance heating thermal evaporation is seen to be the optimal method for achieving low-loss antireflection coatings. The relation among optical constants, microstructures, and stoichiometry is discussed.
ABSTRACT
The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. Reflectance, absorption, and scatter of AR coatings were measured with these apparatuses. The AR coating samples were supplied by Japanese vendors. Each AR coating as supplied was coated with the vendor's coating design by that vendor's coating process. Our measurement apparatuses, methods, and results for these AR coatings are presented here.
