Superabsorbing, Artificial Metal Films Constructed from Semiconductor Nanoantennas.

In 1934, Wilhelm Woltersdorff demonstrated that the absorption of light in an ultrathin, freestanding film is fundamentally limited to 50%. He concluded that reaching this limit would require a film with a real-valued sheet resistance that is exactly equal to R = η/2 ≈ 188.5Ω/□, where [Formula: see text] is the impedance of free space. This condition can be closely approximated over a wide frequency range in metals that feature a large imaginary relative permittivity εr″, that is, a real-valued conductivity σ = ε0εr″ω. A thin, continuous sheet of semiconductor material does not facilitate such strong absorption as its complex-valued permittivity with both large real and imaginary components preclude effective impedance matching. In this work, we show how a semiconductor metafilm constructed from optically resonant semiconductor nanostructures can be created whose optical response mimics that of a metallic sheet. For this reason, the fundamental absorption limit mentioned above can also be reached with semiconductor materials, opening up new opportunities for the design of ultrathin optoelectronic and light harvesting devices.

Photonic-plasmonic coupling of GaAs single nanowires to optical nanoantennas.

We successfully demonstrate the plasmonic coupling between metal nanoantennas and individual GaAs nanowires (NWs). In particular, by using dark-field scattering and second harmonic excitation spectroscopy in partnership with analytical and full-vector FDTD modeling, we demonstrate controlled electromagnetic coupling between individual NWs and plasmonic nanoantennas with gap sizes varied between 90 and 500 nm. The significant electric field enhancement values (up to 20×) achieved inside the NW-nanoantennas gap regions allowed us to tailor the nonlinear optical response of NWs by engineering the plasmonic near-field coupling regime. These findings represent an initial step toward the development of coupled metal-semiconductor resonant nanostructures for the realization of next generation solar cells, detectors, and nonlinear optical devices with reduced footprints and energy consumption.

Vertical "III-V" V-shaped nanomembranes epitaxially grown on a patterned Si[001] substrate and their enhanced light scattering.

We report on a new form of III-V compound semiconductor nanostructures growing epitaxially as vertical V-shaped nanomembranes on Si(001) and study their light-scattering properties. Precise position control of the InAs nanostructures in regular arrays is demonstrated by bottom-up synthesis using molecular beam epitaxy in nanoscale apertures on a SiO(2) mask. The InAs V-shaped nanomembranes are found to originate from the two opposite facets of a rectangular pyramidal island nucleus and extend along two opposite <111> B directions, forming flat {110} walls. Dark-field scattering experiments, in combination with light-scattering theory, show the presence of distinctive shape-dependent optical resonances significantly enhancing the local intensity of incident electromagnetic fields over tunable spectral regions. These new nanostructures could have interesting potential in nanosensors, infrared light emitters, and nonlinear optical elements.

Temperature dependence and aging effects on silicon nanowires photoluminescence.

In this paper we describe the luminescence properties of Si nanowires (NWs) prepared by a maskless synthesis technique, based on the Au-catalyzed wet etching of Si substrates by an aqueous solution of H(2)O(2) and HF. A strong room temperature photoluminescence (PL), centered at about 690 nm, is observed when Si NWs are optically excited. The detailed analysis of the steady-state and time-resolved PL properties of the system as a function of aging, temperature and pump power allows to demonstrate that the emission is due to the radiative recombination of quantum confined excitons. These results open the route towards novel applications of Si NWs in photonics as efficient light sources.

Mechanism of boron diffusion in amorphous silicon.

We have elucidated the mechanism for B migration in the amorphous (a-) Si network. B diffusivity in a-Si is much higher than in crystalline Si; it is transient and increases with B concentration up to 2 x 10(20) B/cm(3). At higher density, B atoms in a-Si quickly precipitate. B diffusion is indirect, mediated by dangling bonds (DB) present in a-Si. The density of DB is enhanced by B accommodation in the a-Si network and decreases because of a-Si relaxation. Accurate data simulations allow one to extract the DB diffusivity, whose activation energy is 2.6 eV. Implications of these results are discussed.