ABSTRACT
Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index contrast between core and cladding of fabricated devices. 1x2 splitting devices based on directional couplers and multimode interference interferometers are demonstrated to have less than 0.45 dB insertion loss with 0.02 ± 0.01 dB power imbalance between the outputs. We demonstrate an 'optical via' with an insertion loss less than 0.45 dB to transfer light from one optical signal plane to another. A 1x4 two-dimensional optical port is experimentally demonstrated to spatially split the input power with an insertion loss of 1.2 dB.
ABSTRACT
Polymeric slot waveguide structure, which pushes the mode field toward the surrounding media, was designed and characterized. The slot waveguide was fabricated by using nanoimprint lithography, and the operation of the slot was demonstrated at 633 nm wavelength with an integrated Young interferometer. The experimental result shows that the nanolithography method provides possibilities to fabricate disposable slot waveguide sensors.
