Chemical Bonding and Crystal Structure Schemes in Atomic/Molecular Layer Deposited Fe-Terephthalate Thin Films.

Advanced deposition routes are vital for the growth of functional metal-organic thin films. The gas-phase atomic/molecular layer deposition (ALD/MLD) technique provides solvent-free and uniform nanoscale thin films with unprecedented thickness control and allows straightforward device integration. Most excitingly, the ALD/MLD technique can enable the in situ growth of novel crystalline metal-organic materials. An exquisite example is iron-terephthalate (Fe-BDC), which is one of the most appealing metal-organic framework (MOF) type materials and thus widely studied in bulk form owing to its attractive potential in photocatalysis, biomedicine, and beyond. Resolving the chemistry and structural features of new thin film materials requires an extended selection of characterization and modeling techniques. Here we demonstrate how the unique features of the ALD/MLD grown in situ crystalline Fe-BDC thin films, different from the bulk Fe-BDC MOFs, can be resolved through techniques such as synchrotron grazing-incidence X-ray diffraction (GIXRD), Mössbauer spectroscopy, and resonant inelastic X-ray scattering (RIXS) and crystal structure predictions. The investigations of the Fe-BDC thin films, containing both trivalent and divalent iron, converge toward a novel crystalline Fe(III)-BDC monoclinic phase with space group C2/c and an amorphous Fe(II)-BDC phase. Finally, we demonstrate the excellent thermal stability of our Fe-BDC thin films.

Conformal Zn-Benzene Dithiol Thin Films for Temperature-Sensitive Electronics Grown via Industry-Feasible Atomic/Molecular Layer Deposition Technique.

The atomic/molecular layer deposition (ALD/MLD) technique combining both inorganic and organic precursors is strongly emerging as a unique tool to design exciting new functional metal-organic thin-film materials. Here, this method is demonstrated to work even at low deposition temperatures and can produce highly stable and conformal thin films, fulfilling the indispensable prerequisites of today's 3D microelectronics and other potential industrial applications. This new ALD/MLD process is developed for Zn-organic thin films grown from non-pyrophoric bis-3-(N,N-dimethylamino)propyl zinc [Zn(DMP)2] and 1,4-benzene dithiol (BDT) precursors. This process yields air-stable Zn-BDT films with appreciably high growth per cycle (GPC) of 4.5 Å at 60 °C. The Zn/S ratio is determined at 0.5 with Rutherford backscattering spectrometry (RBS), in line with the anticipated (Zn─S─C6H6─S─)n bonding scheme. The high degree of conformality is shown using lateral high-aspect-ratio (LHAR) test substrates; scanning electron microscopy (SEM) analysis shows that the film penetration depth (PD) into the LHAR structure with cavity height of 500 nm is over 200 µm (i.e., aspect-ratio of 400). It is anticipated that the electrically insulating metal-organic Zn-BDT thin films grown via the solvent-free ALD/MLD technique, can be excellent barrier layers for temperature-sensitive and flexible electronic devices.

Conformal High-Aspect-Ratio Solid Electrolyte Thin Films for Li-Ion Batteries by Atomic Layer Deposition.

Lithium phosphorus oxynitride (LiPON) is a state-of-the-art solid electrolyte material for thin-film microbatteries. These applications require conformal thin films on challenging 3D surface structures, and among the advanced thin-film deposition techniques, atomic layer deposition (ALD) is believed to stand out in terms of producing appreciably conformal thin films. Here we quantify the conformality (i.e., the evenness of deposition) of thin ALD-grown LiPON films using lateral high-aspect-ratio test structures. Two different lithium precursors, lithium tert-butoxide (LiOtBu) and lithium bis(trimethylsilyl)amide (Li-HMDS), were investigated in combination with diethyl phosphoramidate as the source of oxygen, phosphorus, and nitrogen. The results indicate that the film growth proceeded significantly deeper into the 3D cavities for the films grown from LiOtBu, while the Li-HMDS-based films grew more evenly initially, right after the cavity entrances. These observations can be explained by differences in the precursor diffusion and reactivity. The results open possibilities for the use of LiPON as a solid electrolyte in batteries with high-surface-area electrodes. This could enable faster charging and discharging as well as the use of thin-film technology in fabricating thin-film electrodes of meaningful charge capacity.

Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics.

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors.

The combined atomic/molecular layer deposition (ALD/MLD) technique is emerging as a state-of-the-art synthesis route for new metal-organic thin-film materials with a multitude of properties by combining those of the inorganic and the organic material. A major part of the studies so far reported have focused on aluminum or zinc alkyls, so-called alucone and zincone films, typically grown from trimethyl aluminum (TMA) or diethyl zinc (DEZ) as the metal-bearing precursor, and a simple aliphatic bi-functional alcohol molecule such as ethylene glycol (EG) as the organic precursor. However, these common precursors possess certain disadvantages: both TMA and DEZ are pyrophoric, DEZ being additionally thermally unstable, while EG has a strong tendency for various unideal reaction modes. Here we report novel ALD/MLD processes for alucone and zincone films based on non-pyrophoric bis-diisopropylamido-[3-(N,N-dimethylamino)propyl] aluminum(III) [Al(NiPr2)2(DMP)] and bis-3-(N,N-dimethylamino)propyl zinc(II) [Zn(DMP)2] precursors in combination with hydroquinone (HQ) as the organic precursor. We demonstrate that the [Al(NiPr2)2(DMP)] + HQ and [Zn(DMP)2] + HQ ALD/MLD processes work even at record low deposition temperatures (140 °C and 60 °C, respectively) yielding high-quality and relatively stable Al-HQ and Zn-HQ thin films with appreciably high growth rates (2.8 Å / cycle and 3.2 Å / cycle, respectively). Moreover, these ALD/MLD processes are compatible with the corresponding ALD processes, i.e. [Al(NiPr2)2(DMP)] + H2O and [Zn(DMP)2] + H2O, for the Al2O3 and ZnO films, thus opening up new horizons for the fabrication of novel metal-oxide : organic superlattice structures for e.g. flexible gas-barrier coatings or wearable thermoelectrics.

Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl Zinc.

We present a new type of atomic layer deposition (ALD) process for intermetallic thin films, where diethyl zinc (DEZ) serves as a coreactant. In our proof-of-concept study, FeCl3 is used as the second precursor. The FeCl3 + DEZ process yields in situ crystalline Fe4Zn9 thin films, where the elemental purity and Fe/Zn ratio are confirmed by time-of-flight elastic recoil detection analysis (TOF-ERDA), Rutherford backscattering spectrometry (RBS), atomic absorption spectroscopy (AAS), and energy-dispersive X-ray spectroscopy (EDX) analyses. The film thickness is precisely controlled by the number of precursor supply cycles, as expected for an ALD process. The reaction mechanism is addressed by computational density functional theory (DFT) modeling. We moreover carry out preliminary tests with CuCl2 and Ni(thd)2 in combination with DEZ to confirm that these processes yield Cu-Zn and Ni-Zn thin films with DEZ as well. Thus, we envision an opening of a new ALD approach based on DEZ for intermetallic/metal alloy thin films.

Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition.

Cu and Ag precursors that are volatile, reactive, and thermally stable are currently of high interest for their application in atomic-layer deposition (ALD) of thin metal films. In pursuit of new precursors for coinage metals, namely Cu and Ag, a series of new N-heterocyclic carbene (NHC)-based CuI and AgI complexes were synthesized. Modifications in the substitution pattern of diketonate-based anionic backbones led to five monomeric Cu complexes and four closely related Ag complexes with the general formula [M(tBu NHC)(R)] (M=Cu, Ag; tBu NHC=1,3-di-tert-butyl-imidazolin-2-ylidene; R=diketonate). Thermal analysis indicated that most of the Cu complexes are thermally stable and volatile compared to the more fragile Ag analogs. One of the promising Cu precursors was evaluated for the ALD of nanoparticulate Cu metal deposits by using hydroquinone as the reducing agent at appreciably low deposition temperatures (145-160 °C). This study highlights the considerable impact of the employed ligand sphere on the structural and thermal properties of metal complexes that are relevant for vapor-phase processing of thin films.

Atomic/molecular layer deposition of Ni-terephthalate thin films.

Atomic/molecular layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential applications related to e.g. sustainable energy technologies. Among the 3d metal components, nickel has remained unexplored so far. Here we report a robust and efficient ALD/MLD process for the growth of high-quality nickel terephthalate thin films. The films are deposited from Ni(thd)2 (thd: 2,2,6,6-tetramethyl-3,5-heptanedionate) and terephthalic acid (1,4-benzenedicarboxylic acid) precursors in the temperature range of 180-280 °C, with appreciably high growth rates up to 2.3 Å per cycle at 200 °C. The films are amorphous but the local structure and chemical state of the films are addressed based on XRR, FTIR and RIXS techniques.

Photoactive Thin-Film Structures of Curcumin, TiO2 and ZnO.

Curcumin is known as a biologically active compound and a possible antimicrobial agent. Here, we combine it with TiO2 and ZnO semiconductors, known for their photocatalytic properties, with an eye towards synergistic photo-harvesting and/or antimicrobial effects. We deposit different nanoscale multi-layer structures of curcumin, TiO2 and ZnO, by combining the solution-based spin-coating (S-C) technique and the gas-phase atomic layer deposition (ALD) and molecular layer deposition (MLD) thin-film techniques. As one of the highlights, we demonstrate for these multi-layer structures a red-shift in the absorbance maximum and an expansion of the absorbance edge as far as the longest visible wavelength region, which activates them for the visible light harvesting. The novel fabrication approaches introduced here should be compatible with, e.g., textile substrates, opening up new horizons for novel applications such as new types of protective masks with thin conformal antimicrobial coatings.

Composition-tuned metal-organic thin-film structures based on photoswitchable azobenzene by ALD/MLD.

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based metal-organic structures using the atomic/molecular layer deposition (ALD/MLD) technique; these are highly intriguing materials as azobenzene is one of the prototype organic molecules experiencing photoisomerization. Our Li-, Ca and Fe-AZO thin films deposited from Li(thd) (thd = 2,2,6,6-tetramethyl-3,5-heptanedione), Ca(thd)2, FeCl3 and azobenzene-4,4'-dicarboxylic acid precursors in the temperature range of 250-360 °C exhibit metal-AZO structures not known from bulk samples. In all these structures, the AZO linker molecules are free to undergo the characteristic trans-cis photoisomerization reaction upon UV (360 nm) irradiation. However, this lowers the degree of crystallinity. To address the issue, we investigate hetero-organic structures where TPA (terephthalic acid) is used as another linker component together with AZO. This allows the trans-cis reaction of the AZO moieties to occur without compromising the film crystallinity. Finally, we demonstrate the growth of MOF-on-MOF type Ca-ADA@Ca-TPA thin films also showing the efficient photoisomerization reaction.

Flexible ε-Fe2O3-Terephthalate Thin-Film Magnets through ALD/MLD.

Pliable and lightweight thin-film magnets performing at room temperature are indispensable ingredients of the next-generation flexible electronics. However, conventional inorganic magnets based on f-block metals are rigid and heavy, whereas the emerging organic/molecular magnets are inferior regarding their magnetic characteristics. Here we fuse the best features of the two worlds, by tailoring ε-Fe2O3-terephthalate superlattice thin films with inbuilt flexibility due to the thin organic layers intimately embedded within the ferrimagnetic ε-Fe2O3 matrix; these films are also sustainable as they do not contain rare heavy metals. The films are grown with sub-nanometer-scale accuracy from gaseous precursors using the atomic/molecular layer deposition (ALD/MLD) technique. Tensile tests confirm the expected increased flexibility with increasing organic content reaching a 3-fold decrease in critical bending radius (2.4 ± 0.3 mm) as compared to ε-Fe2O3 thin film (7.7 ± 0.3 mm). Most remarkably, these hybrid ε-Fe2O3-terephthalate films do not compromise the exceptional intrinsic magnetic characteristics of the ε-Fe2O3 phase, in particular the ultrahigh coercive force (∼2 kOe) even at room temperature.

Modulating the Structure and Magnetic Properties of ε-Fe2O3 Nanoparticles via Electrochemical Li+ Insertion.

ε-Fe2O3, a metastable phase of iron oxide, is widely known as a room-temperature multiferroic material or as a superhard magnet. Element substitution into ε-Fe2O3 has been reported in the literature; however, the substituted ions have a strong site preference depending on their ionic radii and valence. In this study, in order to characterize the crystal structure and magnetic properties of ε-Fe2O3 in the Fe2+/Fe3+ coexisting states, Li+ was electrochemically inserted into ε-Fe2O3 to reduce Fe3+. The discharge and charge of Li+ into/from ε-Fe2O3 revealed that Li+ insertion was successful. X-ray magnetic circular dichroism results indicated that the reduced Fe did not exhibit site preference. Increasing the Li+ content in ε-Fe2O3 resulted in decreased saturation magnetization and irregular variation of the coercive field. We present a comprehensive discussion of how magnetic properties are modified with increasing Li+ content using transmission electron microscopy images and considering the Li+ diffusion coefficient. The results suggest that inserting Li+ into crystalline ε-Fe2O3 is a useful tool for characterizing crystal structure, lithiation limit, and magnetic properties in the coexistence of Fe2+/Fe3+.

Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release.

The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.

Ultrasensitive and recyclable superstructure of AuSiO2@Ag wire for surface-enhanced Raman scattering detection of thiocyanate in urine and human serum.

Thiocyanate level in the human system can serve as a biomarker to distinguish smokers from non-smokers. Thiocyanate is a potential goitrogen, thus an accurate determination may help to identify lactating mothers with high thiocyanate dosage, thereby preventing the transport of excess SCN- to infants. Surface-enhanced Raman spectroscopy has become a versatile and reliable technique to detect SCN- in different media. However, the conventional surface-enhanced Raman scattering (SERS) substrates used to detect SCN- are often discarded after use. The frequent disposal of such metal nanoparticles is detrimental to the environment and makes the SERS-based detection of SCN- uneconomical. In this study, we present fabrication of a new, ultrasensitive and recyclable SERS substrate, based on an AuSiO2@Ag wire (W) superstructure, to detect SCN- in different media. The hierarchical AuSiO2@AgW substrate was obtained by forming nano-sized patches of SiO2 on micron-sized AgW and anchoring 30 nm-sized gold nanoparticles on the patches with mercaptopropyltrimethoxysilane. This ultrasensitive substrate could detect SCN- at a low concentration of 0.001 µM in water, and 0.01 µM in urine and human serum. In addition, a facile procedure to regenerate and recycle the SCN- bound AuSiO2@AgW platform in different media has been demonstrated. The insight gained in the present study can serve as a promising and powerful method for fabrication of active and recyclable substrates for SERS-based detection of SCN-.

Recurrent angio-oedema--three cases of C1 inhibitor deficiency.

C1 Inhibitor deficiency is a rare disorder, characterised by recurrent angio-oedema of skin, upper respiratory and gastrointestinal tracts. It can be a mimicker of acute abdomen or anaphylaxis to drug or food and lead on to unnecessary overtreatment. Three case reports of such patients with history of recurrent abdominal pain and angio-oedema due to C1 Inhibitor deficiency is reported here.