ABSTRACT
This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B 4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B 4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.
ABSTRACT
In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ± 0.05°. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard x-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of ± 0.05°, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard x-ray imaging of highly diverging sources.
ABSTRACT
Almost half of the X-ray beamlines at the Cornell High Energy Synchrotron Source (CHESS) are based on multilayer optics. ;Traditional' multilayers with an energy resolution of DeltaE/E approximately 2% are routinely used to deliver X-ray flux enhanced by a factor of 10(2) in comparison with standard Si(111) optics. Sagittal-focusing multilayers with fixed radius provide an additional factor of 10 gain in flux density. High-resolution multilayer optics with DeltaE/E approximately 0.2% are now routinely used by MacCHESS crystallographers. New wide-bandpass multilayers with DeltaE/E = 5% and 10% have been designed and tested for potential applications in macromolecular crystallography. Small d-spacing multilayers with d < or = 20 A have been successfully used to extend the energy range of multilayer optics. Analysis of the main characteristics of the Mo/B4C and W/B4C small d-spacing multilayer optics shows enhancement in their performance at higher energies. Chemical vapour deposited SiC, with a bulk thermal conductivity of a factor of two higher than that of silicon, has been successfully introduced as a substrate material for multilayer optics. Characteristics of different types of multilayer optics at CHESS beamlines and their applications in a variety of scattering, diffraction and imaging techniques are discussed.
