Fluorine Passivation of Defects and Interfaces in Crystalline Silicon.

Defects and impurities in silicon limit carrier lifetimes and the performance of solar cells. This work explores the use of fluorine to passivate defects in silicon for solar cell applications. We present a simple method to incorporate fluorine atoms into the silicon bulk and interfaces by annealing samples coated with thin thermally evaporated fluoride overlayers. It is found that fluorine incorporation does not only improve interfaces but can also passivate bulk defects in silicon. The effect of fluorination is observed to be comparable to hydrogenation, in passivating grain boundaries in multicrystalline silicon, improving the surface passivation quality of phosphorus-doped poly-Si-based passivating contact structures, and recovering boron-oxygen-related light-induced degradation in boron-doped Czochralski-grown silicon. Our results highlight the possibility to passivate defects in silicon without using hydrogen and to combine fluorination and hydrogenation to further improve the overall passivation effect, providing new opportunities to improve solar cell performance.

Titanium Nitride Electron-Conductive Contact for Silicon Solar Cells By Radio Frequency Sputtering from a TiN Target.

Efficient and stable electron selective materials compatible with commercial production are essential to the fabrication of dopant-free silicon solar cells. In this work, we report an air-stable TiN (titanium nitride) polycrystalline film, deposited using radio frequency sputtering process, as an electron selective contact in silicon solar cells. TiN films deposited at 300 W and 1.5 mTorr exhibit a low contact resistivity of 2.0 mΩ·cm2. Furthermore, the main factors and mechanisms affecting the carrier selectivity properties are also explored. TiN layers as full area rear electron contacts in n-type silicon solar cells have been successfully implemented, even though TiN film contains some oxygen. This process yields a 17% increment in relative efficiency in comparison with reference devices (n-Si/Al contact). Hence, considering the low thermal budget, scalable technique, and low contact resistivity, the TiN layers can pave the way to fabricate high-efficiency selective contact silicon solar cells with a higher degree of reproducibility.

Hydrogenation of Phosphorus-Doped Polycrystalline Silicon Films for Passivating Contact Solar Cells.

We characterize and discuss the impact of hydrogenation on the performance of phosphorus-doped polycrystalline silicon (poly-Si) films for passivating contact solar cells. Combining various characterization techniques including transmission electron microscopy, energy-dispersive X-ray spectroscopy, low-temperature photoluminescence spectroscopy, quasi-steady-state photoconductance, and Fourier-transform infrared spectroscopy, we demonstrate that the hydrogen content inside the doped poly-Si layers can be manipulated to improve the quality of the passivating contact structures. After the hydrogenation process of poly-Si layers fabricated under different conditions, the effective lifetime and the implied open circuit voltage are improved for all investigated samples (up to 4.75 ms and 728 mV on 1 Ω cm n-type Si substrates). Notably, samples with very low initial passivation qualities show a dramatic improvement from 350 µs to 2.7 ms and from 668 to 722 mV.

In situ recombination junction between p-Si and TiO2 enables high-efficiency monolithic perovskite/Si tandem cells.

Increasing the power conversion efficiency of silicon (Si) photovoltaics is a key enabler for continued reductions in the cost of solar electricity. Here, we describe a two-terminal perovskite/Si tandem design that increases the Si cell's output in the simplest possible manner: by placing a perovskite cell directly on top of the Si bottom cell. The advantageous omission of a conventional interlayer eliminates both optical losses and processing steps and is enabled by the low contact resistivity attainable between n-type TiO2 and Si, established here using atomic layer deposition. We fabricated proof-of-concept perovskite/Si tandems on both homojunction and passivating contact heterojunction Si cells to demonstrate the broad applicability of the interlayer-free concept. Stabilized efficiencies of 22.9 and 24.1% were obtained for the homojunction and passivating contact heterojunction tandems, respectively, which could be readily improved by reducing optical losses elsewhere in the device. This work highlights the potential of emerging perovskite photovoltaics to enable low-cost, high-efficiency tandem devices through straightforward integration with commercially relevant Si solar cells.

Microchannel contacting of crystalline silicon solar cells.

There is tremendous interest in reducing losses caused by the metal contacts in silicon photovoltaics, particularly the optical and resistive losses of the front metal grid. One commonly sought-after goal is the creation of high aspect-ratio metal fingers which provide an optically narrow and low resistance pathway to the external circuit. Currently, the most widely used metal contact deposition techniques are limited to widths and aspect-ratios of ~40 µm and ~0.5, respectively. In this study, we introduce the use of a micropatterned polydimethylsiloxane encapsulation layer to form narrow (~20 µm) microchannels, with aspect-ratios up to 8, on the surface of solar cells. We demonstrate that low temperature metal pastes, electroless plating and atomic layer deposition can all be used within the microchannels. Further, we fabricate proof-of-concept structures including simple planar silicon heterojunction and homojunction solar cells. While preliminary in both design and efficiency, these results demonstrate the potential of this approach and its compatibility with current solar cell architectures.