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1.
Article in English | MEDLINE | ID: mdl-22481769

ABSTRACT

This work describes the assessment of the acoustic properties of sputtered tantalum oxide films intended for use as high-impedance films of acoustic reflectors for solidly mounted resonators operating in the gigahertz frequency range. The films are grown by sputtering a metallic tantalum target under different oxygen and argon gas mixtures, total pressures, pulsed dc powers, and substrate biases. The structural properties of the films are assessed through infrared absorption spectroscopy and X-ray diffraction measurements. Their acoustic impedance is assessed by deriving the mass density from X-ray reflectometry measurements and the acoustic velocity from picosecond acoustic spectroscopy and the analysis of the frequency response of the test resonators.

2.
Article in English | MEDLINE | ID: mdl-22293743

ABSTRACT

We investigate the excitation and propagation of acoustic waves in polycrystalline aluminum nitride films along the directions parallel and normal to the c-axis. Longitudinal and transverse propagations are assessed through the frequency response of surface acoustic wave and bulk acoustic wave devices fabricated on films of different crystal qualities. The crystalline properties significantly affect the electromechanical coupling factors and acoustic properties of the piezoelectric layers. The presence of misoriented grains produces an overall decrease of the piezoelectric activity, degrading more severely the excitation and propagation of waves traveling transversally to the c-axis. It is suggested that the presence of such crystalline defects in c-axis-oriented films reduces the mechanical coherence between grains and hinders the transverse deformation of the film when the electric field is applied parallel to the surface.

3.
Article in English | MEDLINE | ID: mdl-18051171

ABSTRACT

In this paper we describe a method to assess the piezoelectric response of a piezoelectric thin film deposited on a conductive substrate. It is based on analyzing the frequency response of a surface acoustic wave (SAW) filter made on the piezoelectric thin film. For this analysis, we use a circuital model that takes into account the theoretical response of the ideal filter along with all the external and internal parasitic effects that deteriorate the response. Using this model, we can obtain the electromechanical coupling factor of the piezoelectric material (k2m) with good accuracy. If parasitic effects are not considered, k2m can be underestimated by a factor of up to 20. We have tested our model using SAW filters made on A1N thin films sputtered on substrates with different conductivities. A discussion on the relation between the different circuital elements and the physical properties of the filters also is provided.

4.
Article in English | MEDLINE | ID: mdl-15128222

ABSTRACT

We present a study of the effect of particle bombardment on the preferred orientation and the residual stress of polycrystalline aluminum nitride (AlN) thin films for surface acoustic wave (SAW) applications. Films were deposited on silicon (100) substrates by radio frequency (RF) sputtering of an aluminum target in an argon and nitrogen gas mixture. The main deposition parameters were changed as follows: the total pressure from 4 mTorr to 11 mTorr, the N2 content in the gas mixture from 20% to 80%, and the substrate self-bias voltage from -10 V to -30 V. If a sufficiently high negative substrate self-bias voltage is induced, (00.2)-oriented films are obtained over the full ranges of pressure and N2 content. Such films have values of residual stress ranging from -3 GPa to +1 GPa, depending on the deposition conditions. Our results suggest that the energy of the Ar ions colliding with the substrate controls the preferred orientation of the films, whereas the directionality of the ions (for the same energy) is the main factor determining the residual stress. To demonstrate the suitability of our material for the intended application, SAW filters with good electroacoustic response have been fabricated using AlN thin films with optimized (00.2) orientation and controlled residual stress.

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