Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4-250†eV.

In this work, the refractive index of beryllium in the photon energy range 20.4-250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate. Measurements were carried out at the optics beamline of the BESSY II synchrotron radiation source. The absorption coefficient ß was found directly from the transmission coefficient of the films, and the real part of the polarizability δ was calculated from the Kramers-Kronig relations. A comparison is carried out with results obtained 20 years ago at the ALS synchrotron using a similar methodology.

Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm.

The He-II (λ=30.4 nm) emission line is one of the spectral channels chosen to study solar corona. This Letter reports on investigations of novel beryllium (Be)/magnesium multilayer coatings which, when incorporated beneath a protective bilayer of aluminium and Be, ensure particularly high-reflection coefficients of up to 56%, a spectral width of Δλ=1.6 nm (λ/Δλ≈20), and high temporal stability.

High-reflection Mo/Be/Si multilayers for EUV lithography.

The effect of Be layers on the reflection coefficients of Mo/Be/Si multilayer mirrors in the extreme ultraviolet (EUV) region is reported. Samples were studied using laboratory and synchrotron based reflectometry, and high-resolution transmission electron microscopy. The samples under study have reflection coefficients above 71% at 13.5 nm and more than 72% at 12.9 nm in a near normal incidence mode. Calculations show that by optimizing the thickness of the Be layer it should be possible to increase the reflection coefficient by another 0.5-1%. These results are of considerable interest for EUV lithography.