X-FAST: A versatile, high-throughput, and user-friendly XUV femtosecond absorption spectroscopy tabletop instrument.

We present the X-FAST (XUV Femtosecond Absorption Spectroscopy Tabletop) instrument at the University of Wisconsin-Madison. The instrument produces femtosecond extreme ultraviolet photon pulses via high-harmonic generation in the range of 40-72 eV, as well as optical pump pulses for transient-absorption experiments. The system implements a gas-cooled sample cell that enables studying the dynamics of thermally sensitive thin-film samples. This paper provides potential users with specifications of the optical, vacuum, data acquisition, and sample cooling systems of the X-FAST instrument, along with performance metrics and data of an ultrafast laser-induced phase transition in a Ni2MnGa Heusler thin film.

Spectromicroscopy of Nanoscale Materials in the Tender X-Ray Regime Enabled by a High Efficient Multilayer-Based Grating Monochromator.

The combination of near edge X-ray absorption spectroscopy with nanoscale X-ray imaging is a powerful analytical tool for many applications in energy technologies, catalysis, which are critical to combat climate change, as well as microelectronics and life science. Materials from these scientific areas often contain key elements, such as Si, P, S, Y, Zr, Nb, and Mo as well as lanthanides, whose X-ray absorption edges lie in the so-called tender photon energy range 1.5-5.0 keV. Neither conventional grazing incidence grating nor crystal monochromators have high transmission in this energy range, thereby yielding the tender photon energy gap. To close this gap, a monochromator setup based on a multilayer coated blazed plane grating and plane mirror is devised. The measurements show that this novel concept improves the photon flux in the tender X-ray regime by two-orders-of-magnitude enabling previously unattainable laboratory and synchrotron-based studies. This setup is applied to perform nanoscale spectromicroscopy studies. The high photon flux provides sufficient sensitivity to obtain the electronic structure of Mo in platinum-free MoNi4 nanoparticles for electrochemical energy conversion. Additionally, it is shown that the chemical bonding of nano-structures in integrated circuits can be distinguished by the electronic configuration at the Si-K edge.

The meV XUV-RIXS facility at UE112-PGM1 of BESSY II.

Resonant inelastic X-ray scattering in the XUV-regime has been implemented at BESSY II, pushing for a few-meV bandwidth in inelastic X-ray scattering at transition metal M-edges, rare earth N-edges and the K-edges of light elements up to carbon with full polarization control. The new dedicated low-energy beamline UE112-PGM1 has been designed to provide 1 µm vertical and 20 µm horizontal beam dimensions that serve together with sub-micrometre solid-state sample positioning as the source point for a high-resolution plane grating spectrometer and a high-transmission Rowland spectrometer for rapid overview spectra. The design and commissioning results of the beamline and high-resolution spectrometer are presented. Helium autoionization spectra demonstrate a resolving power of the beamline better than 10 000 at 64 eV with a 300 lines mm-1 grating while the measured resolving power of the spectrometer in the relevant energy range is 3000 to 6000.

Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures.

The spatial and compositional complexity of 3D structures employed in today's nanotechnologies has developed to a level at which the requirements for process development and control can no longer fully be met by existing metrology techniques. For instance, buried parts in stratified nanostructures, which are often crucial for device functionality, can only be probed in a destructive manner in few locations as many existing nondestructive techniques only probe the objects surfaces. Here, it is demonstrated that grazing exit X-ray fluorescence can simultaneously characterize an ensemble of regularly ordered nanostructures simultaneously with respect to their dimensional properties and their elemental composition. This technique is nondestructive and compatible to typically sized test fields, allowing the same array of structures to be studied by other techniques. For crucial parameters, the technique provides sub-nm discrimination capabilities and it does not require access-limited large-scale research facilities as it is compatible to laboratory-scale instrumentation.

Performance and characterization of the FinEstBeAMS beamline at the MAX IV Laboratory.

FinEstBeAMS (Finnish-Estonian Beamline for Atmospheric and Materials Sciences) is a multidisciplinary beamline constructed at the 1.5 GeV storage ring of the MAX IV synchrotron facility in Lund, Sweden. The beamline covers an extremely wide photon energy range, 4.5-1300 eV, by utilizing a single elliptically polarizing undulator as a radiation source and a single grazing-incidence plane grating monochromator to disperse the radiation. At photon energies below 70 eV the beamline operation relies on the use of optical and thin-film filters to remove higher-order components from the monochromated radiation. This paper discusses the performance of the beamline, examining such characteristics as the quality of the gratings, photon energy calibration, photon energy resolution, available photon flux, polarization quality and focal spot size.

Shape- and Element-Sensitive Reconstruction of Periodic Nanostructures with Grazing Incidence X-ray Fluorescence Analysis and Machine Learning.

The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of high importance for the development of current and next-generation integrated electronic circuits. Modern transistor architectures for, e.g., FinFETs are realized by lithographic fabrication of complex, well-ordered nanostructures. Recently, a novel characterization technique based on X-ray fluorescence measurements in grazing incidence geometry was proposed for such applications. This technique uses the X-ray standing wave field, arising from an interference between incident and the reflected radiation, as a nanoscale sensor for the dimensional and compositional parameters of the nanostructure. The element sensitivity of the X-ray fluorescence technique allows for a reconstruction of the spatial element distribution using a finite element method. Due to a high computational time, intelligent optimization methods employing machine learning algorithms are essential for timely provision of results. Here, a sampling of the probability distributions by Bayesian optimization is not only fast, but it also provides an initial estimate of the parameter uncertainties and sensitivities. The high sensitivity of the method requires a precise knowledge of the material parameters in the modeling of the dimensional shape provided that some physical properties of the material are known or determined beforehand. The unknown optical constants were extracted from an unstructured but otherwise identical layer system by means of soft X-ray reflectometry. The spatial distribution profiles of the different elements contained in the grating structure were compared to scanning electron and atomic force microscopy and the influence of carbon surface contamination on the modeling results were discussed. This novel approach enables the element sensitive and destruction-free characterization of nanostructures made of silicon nitride and silicon oxide with sub-nm resolution.

Characterization of megahertz X-ray laser beams by multishot desorption imprints in PMMA.

Proper diagnostics of intense free-electron laser (FEL) X-ray pulses is indisputably important for experimental data analysis as well as for the protection of beamline optical elements. New challenges for beam diagnostic methods are introduced by modern FEL facilities capable of delivering powerful pulses at megahertz (MHz) repetition rates. In this paper, we report the first characterization of a defocused MHz 13.5-nm beam generated by the free-electron laser in Hamburg (FLASH) using the method of multi-pulse desorption imprints in poly(methyl methacrylate)(PMMA). The beam fluence profile is reconstructed in a novel and highly accurate way that takes into account the nonlinear response of material removal to total dose delivered by multiple pulses. The algorithm is applied to experimental data of single-shot ablation imprints and multi-shot desorption imprints at both low (10 Hz) and high (1 MHz) repetition rates. Reconstructed response functions show a great agreement with the theoretical desorption response function model.

BioMAX - the first macromolecular crystallography beamline at MAX IV Laboratory.

BioMAX is the first macromolecular crystallography beamline at the MAX IV Laboratory 3 GeV storage ring, which is the first operational multi-bend achromat storage ring. Due to the low-emittance storage ring, BioMAX has a parallel, high-intensity X-ray beam, even when focused down to 20 µm × 5 µm using the bendable focusing mirrors. The beam is tunable in the energy range 5-25 keV using the in-vacuum undulator and the horizontally deflecting double-crystal monochromator. BioMAX is equipped with an MD3 diffractometer, an ISARA high-capacity sample changer and an EIGER 16M hybrid pixel detector. Data collection at BioMAX is controlled using the newly developed MXCuBE3 graphical user interface, and sample tracking is handled by ISPyB. The computing infrastructure includes data storage and processing both at MAX IV and the Lund University supercomputing center LUNARC. With state-of-the-art instrumentation, a high degree of automation, a user-friendly control system interface and remote operation, BioMAX provides an excellent facility for most macromolecular crystallography experiments. Serial crystallography using either a high-viscosity extruder injector or the MD3 as a fixed-target scanner is already implemented. The serial crystallography activities at MAX IV Laboratory will be further developed at the microfocus beamline MicroMAX, when it comes into operation in 2022. MicroMAX will have a 1 µm × 1 µm beam focus and a flux up to 1015 photons s-1 with main applications in serial crystallography, room-temperature structure determinations and time-resolved experiments.

Conception of diffractive wavefront correction for XUV and soft x-ray spectroscopy.

We present a simple and precise method to minimize aberrations of mirror-based, wavelength-dispersive spectrometers for the extreme ultraviolet (XUV) and soft x-ray domain. The concept enables an enhanced resolving power $ E/\Delta E $E/ΔE, in particular, close to the diffraction limit over a spectral band of a few percent around the design energy of the instrument. Our optical element, the "diffractive wavefront corrector" (DWC), is individually shaped to the form and figure error of the mirror profile and might be written directly with a laser on a plane and even strongly curved substrates. Theory and simulations of various configurations, like Hettrick-Underwood or compact, highly efficient all-in-one setups for $ {{\rm TiO}_2} $TiO2 spectroscopy with $ E/\Delta E \mathbin{\lower.3ex\hbox{$\buildrel{\displaystyle{\lt}}\over{\smash{\displaystyle\sim}\vphantom{_x}}$}} 4.5 \times {10^4} $E/ΔE∼x<4.5×104, are addressed, as well as aspects of their experimental realization.

Theoretical analysis and optimization of highly efficient multilayer-coated blazed gratings with high fix-focus constant for the tender X-ray region.

The problem of X-ray diffraction from multilayer-coated blazed diffraction gratings is analyzed. Invalidity of the conventional condition of maximal diffraction efficiency observed in previous experiments is explained theoretically. This is attributed to two factors: contribution of anti-blaze facets to diffraction efficiency and effect of strongly asymmetric diffraction. We demonstrate that a proper choice of the multilayer d-spacing allows to design grating with the diffraction efficiency close to the maximal possible one throughout the tender X-ray range (E∼1-5 keV). An optimization procedure is suggested for the first time to choose the optimal grating parameters and the operation diffraction order to obtain a high fix-focus constant and high diffraction efficiency simultaneously in a wide spectral range.

Optimized highly efficient multilayer-coated blazed gratings for the tender X-ray region.

The optimized design of multilayer-coated blazed gratings (MLBG) for high-flux tender X-ray monochromators was systematically studied by numerical simulations. The resulting correlation between the multilayer d-spacing and grating blaze angle significantly deviated from the one predicted by conventional equations. Three high line density gratings with different blaze angles were fabricated and coated by the same Cr/C multilayer. The MLBG with an optimal blaze angle of 1.0° showed a record efficiency reaching 60% at 3.1 keV and 4.1 keV. The measured efficiencies of all three gratings were consistent with calculated results proving the validity of the numerical simulation and indicating a more rigorous way to design the optimal MLBG structure.

Optimization of the size and shape of the scanning aperture in autocollimator-based deflectometric profilometers.

Deflectometric profilometers based on industrial electronic autocollimators (ACs), as the ELCOMAT-3000, have become indispensable tools for precision form measurements of optical surfaces. A growing number of labs at synchrotron and free electron laser x-ray facilities are going for BESSY-II NOM-like versions of the AC-based profilometers. These tools have proven capable of characterizing state-of-the-art aspherical x-ray optics with an accuracy on the level of 100 nrad (root-mean-square) over the spatial frequency range limited by the size of the aperture used in the profilometer. Typically, a round aperture with a diameter of about 2.5 mm is used. Previous investigations have shown that with the optimally aligned 2.5-mm aperture, the spatial resolution of a NOM-like profilometer corresponding to the first zero-crossing of the optical transform function (OTF) is ∼1.2 mm. In this paper, we investigate the performance of an AC ELCOMAT-3000 for a slope profilometer with different aperture sizes and shapes. The results of angular calibration of the AC equipped with circular and rectangular apertures placed at different distances from the AC are discussed. The calibration was performed at the Physikalisch-Technische Bundesanstalt using the original experimental arrangements, also discussed in the paper. The OTF measurements with the specially developed test sample with chirped surface slope profiles were performed at the Advanced Light Source X-Ray Optics Laboratory (XROL) in application to a new optical surface measuring system under development at the XROL. In the OTF measurements, we have shown that application of a rectangular aperture with dimensions of 1.5 mm × 3 mm improves the spatial resolution in the tangential direction by a factor of ∼1.4 compared to that of the standard circular aperture of 2.5-mm diameter. We believe that the results of our investigations are crucial for reaching fundamental metrological limits in deflectometric profilometry utilizing state-of-the-art electronic autocollimators.

CAMP@FLASH: an end-station for imaging, electron- and ion-spectroscopy, and pump-probe experiments at the FLASH free-electron laser.

The non-monochromatic beamline BL1 at the FLASH free-electron laser facility at DESY was upgraded with new transport and focusing optics, and a new permanent end-station, CAMP, was installed. This multi-purpose instrument is optimized for electron- and ion-spectroscopy, imaging and pump-probe experiments at free-electron lasers. It can be equipped with various electron- and ion-spectrometers, along with large-area single-photon-counting pnCCD X-ray detectors, thus enabling a wide range of experiments from atomic, molecular, and cluster physics to material and energy science, chemistry and biology. Here, an overview of the layout, the beam transport and focusing capabilities, and the experimental possibilities of this new end-station are presented, as well as results from its commissioning.

Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser.

Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.

Effect of the surface roughness on X-ray absorption by mirrors operating at extremely small grazing angles.

This study theoretically analyzes an increase in X-ray absorption by a grazing incidence mirror due to its surface roughness. We demonstrate that the increase in absorption can be several hundred times larger than predicted by the Nevot-Croce formula. As a result, absorption enhances by several times compared to a perfectly smooth mirror despite the extremely small grazing angle of an incident X-ray beam (a fraction of the critical angle of the total external reflection) and the high quality of the reflecting surface (the roughness height was 0.5 nm in modeling). The main contribution to the absorption increase was dictated by the mid-scale roughness (waviness) of the virgin substrate surface, whose quality thus defines an absorption enhancement. The approach was applied to the analysis of two real mirrors used in a synchrotron (BESSY-I) and a European X-ray free-electron laser (XFEL) beamline. The modern surface finishing technology of elastic emission machining provides extremely low substrate waviness, guaranteeing the negligible effect of the surface roughness on the absorption increase.

Damage thresholds for blaze diffraction gratings and grazing incidence optics at an X-ray free-electron laser.

The Linac Coherent Light Source is upgrading its machine to high repetition rate and to extended ranges. Novel coatings, with limited surface oxidation, which are able to work at the carbon edge, are required. In addition, high-resolution soft X-ray monochromators become necessary. One of the big challenges is to design the mirror geometry and the grating profile to have high reflectivity (or efficiency) and at the same time survive the high peak energy of the free-electron laser pulses. For these reasons the experimental damage threshold, at 900 eV, of two platinum-coated gratings with different blazed angles has been investigated. The gratings were tested at 1° grazing incidence. To validate a model for which the damage threshold on the blaze grating can be estimated by calculating the damage threshold of a mirror with an angle of incidence identical to the angle of incidence on the grating plus the blaze angle, tests on Pt-coated substrates have also been performed. The results confirmed the prediction. Uncoated silicon, platinum and SiB3 (both deposited on a silicon substrate) were also investigated. In general, the measured damage threshold at grazing incidence is higher than that calculated under the assumption that there is no energy transport from the volume where the photons are absorbed. However, it was found that, for the case of the SiB3 coating, the grazing incidence condition did not increase the damage threshold, indicating that the energy transport away from the extinction volume is negligible.

Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.

The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.

Coatings for FEL optics: preparation and characterization of B4C and Pt.

Large X-ray mirrors are required for beam transport at both present-day and future free-electron lasers (FELs) and synchrotron sources worldwide. The demand for large mirrors with lengths up to 1 m single layers consisting of light or heavy elements has increased during the last few decades. Accordingly, surface finishing technology is now able to produce large substrate lengths with micro-roughness on the sub-nanometer scale. At the Helmholtz-Zentrum Geesthacht (HZG), a 4.5 m-long sputtering facility enables us to deposit a desired single-layer material some tens of nanometers thick. For the European XFEL project, the shape error should be less than 2 nm over the whole 1 m X-ray mirror length to ensure the safe and efficient delivery of X-ray beams to the scientific instruments. The challenge is to achieve thin-film deposition on silicon substrates, benders and gratings without any change in mirror shape. Thin films of boron carbide and platinum with a thickness in the range 30-100 nm were manufactured using the HZG sputtering facility. This setup is able to cover areas of up to 1500 mm × 120 mm in one step using rectangular sputtering sources. The coatings produced were characterized using various thin-film methods. It was possible to improve the coating process to achieve a very high uniformity of the layer thickness. The movement of the substrate in front of the sputtering source has been optimized. A variation in B4C layer thickness below 1 nm (peak-to-valley) was achieved at a mean thickness of 51.8 nm over a deposition length of 1.5 m. In the case of Pt, reflectometry and micro-roughness measurements were performed. The uniformity in layer thickness was about 1 nm (peak-to-valley). The micro-roughness of the Pt layers showed no significant change in the coated state for layer thicknesses of 32 nm and 102 nm compared with the uncoated substrate state. The experimental results achieved will be discussed with regard to current restrictions and future developments.

Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH.

The extreme-ultraviolet double-stage imaging Raman spectrometer is a permanent experimental endstation at the plane-grating monochromator beamline branch PG1 at FLASH at DESY in Hamburg, Germany. This unique instrument covers the photon energy range from 20 to 200 eV with high energy resolution of about 2 to 20 meV (design values) featuring an efficient elastic line suppression as well as effective stray light rejection. Such a design enables studies of low-energy excitations like, for example, phonons in solids close to the vicinity of the elastic line. The Raman spectrometer effectively operates with four reflective off-axial parabolic mirrors and two plane-grating units. The optics quality and their precise alignment are crucial to guarantee best performance of the instrument. Here, results on a comprehensive investigation of the quality of the spectrometer diffraction gratings are presented. The gratings have been characterized by ex situ metrology at the BESSY-II Optics Laboratory, employing slope measuring deflectometry and interferometry as well as atomic force microscopy studies. The efficiency of these key optical elements has been measured at the at-wavelength metrology laboratory using the reflectometer at the BESSY-II Optics beamline. Also, the metrology results are discussed with respect to the expected resolving power of the instrument by including them in ray-tracing studies of the instrument.

High precision tilt stage as a key element to a universal test mirror for characterization and calibration of slope measuring instruments.

The ultimate performance of surface slope metrology instrumentation, such as long trace profilers and auto-collimator based deflectometers, is limited by systematic errors that are increased when the entire angular range is used for metrology of significantly curved optics. At the ALS X-Ray Optics Laboratory, in collaboration with the HZB/BESSY-II and PTB (Germany) metrology teams, we are working on a calibration method for deflectometers, based on a concept of a universal test mirror (UTM) [V. V. Yashchuk et al., Proc. SPIE 6704, 67040A (2007)]. Potentially, the UTM method provides high performance calibration and accounts for peculiarities of the optics under test (e.g., slope distribution) and the experimental arrangement (e.g., the distance between the sensor and the optic under test). At the same time, the UTM calibration method is inherently universal, applicable to a variety of optics and experimental arrangements. In this work, we present the results of tests with a key component of the UTM system, a custom high precision tilt stage, which has been recently developed in collaboration with Physik Instrumente, GmbH. The tests have demonstrated high performance of the stage and its capability (after additional calibration) to provide angular calibration of surface slope measuring profilers over the entire instrumental dynamic range with absolute accuracy better than 30 nrad. The details of the stage design and tests are presented. We also discuss the foundation of the UTM method and calibration algorithm, as well as the possible design of a full scale UTM system.