ABSTRACT
The refractive index of a y-cut SiO2 crystal surface is reconstructed from orientation-dependent soft X-ray reflectometry measurements in the energy range from 45 to 620â eV. Owing to the anisotropy of the crystal structure in the (100) and (001) directions, a significant deviation of the measured reflectance at the Si L 2,3 and O K absorption edges is observed. The anisotropy in the optical constants reconstructed from these data is also confirmed by ab initio Bethe-Salpeter equation calculations for the O K edge. This new experimental data set expands the existing literature data for quartz crystal optical constants significantly, particularly in the near-edge regions.
ABSTRACT
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for high-NA EUV photo-lithography (EUVL) imaging. The model is derived by combined analysis of the measured EUV and x ray reflectivity of an industry-representative mask blank. These two sets of measurements were analyzed using a combined free-form analysis procedure that delivers high-resolution x ray and EUV optical constant depth profiles based on self-adapted sets of sublayers as thin as 0.25 nm providing a more accurate description of the reflectivity than obtained from only EUV reflectivity. "Free-form analysis" means that the shape of the layer interfaces in the model is determined experimentally and is not given a priori by the structure model. To reduce the numerical effort for EUV imaging simulations, a low-resolution model of the multilayer and absorber stack with sublayer thicknesses larger than 2 nm, that fits to only the EUV reflectance, was derived from the high-resolution model. Rigorous high-NA EUVL simulations were done to compare the performance of the new model to our previous work [Proc. SPIE8886, 88860B (2013)PSISDG0277-786X10.1117/12.2030663].
ABSTRACT
Following the recent demonstration of grazing-incidence X-ray fluorescence (GIXRF)-based characterization of the 3D atomic distribution of different elements and dimensional parameters of periodic nanoscale structures, this work presents a new computational scheme for the simulation of the angular-dependent fluorescence intensities from such periodic 2D and 3D nanoscale structures. The computational scheme is based on the dynamical diffraction theory in many-beam approximation, which allows a semi-analytical solution to the Sherman equation to be derived in a linear-algebraic form. The computational scheme has been used to analyze recently published GIXRF data measured on 2D Si3N4 lamellar gratings, as well as on periodically structured 3D Cr nanopillars. Both the dimensional and structural parameters of these nanostructures have been reconstructed by fitting numerical simulations to the experimental GIXRF data. Obtained results show good agreement with nominal parameters used in the manufacturing of the structures, as well as with reconstructed parameters based on the previously published finite-element-method simulations, in the case of the Si3N4 grating.
ABSTRACT
Using soft x-ray diffraction at the Dy-M5 resonance, pronounced circular dichroism in the ferroelectric phase of DyMnO3 is observed in connection with sizable b and c components of the Dy-4f magnetic moments. This provides strong evidence for cycloidal order of the 4f moments, corroborating that inversion-symmetry breaking in this material is not accomplished by the Mn spins alone. The 4f circular dichroism allows us to image multiferroic domains that are imprinted on the surface of DyMnO3 using the local charging by the x-ray beam via the photoelectric effect.
