ABSTRACT
The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.
ABSTRACT
Octahomotetraoxacalix[4]arenes bearing long alkyl chains on their lower rim were prepared. Ester 4a existed in a 1,2-alternate conformation in its crystal structure, which was examined by single-crystal X-ray diffraction analysis. To prepare liquid crystalline materials possessing calixarene moieties by self-assembling, carboxylic acid derivatives 5 were synthesized. Among them, 5c, the octadecyloxy derivative, showed smectic liquid crystal phase. Homooxacalixarenes 5 also formed liquid crystal phases with longer layer distances when two equivalent moles of 1,2-ethylenediamine were added as a linker. These phases were investigated with X-ray diffraction, differential scanning calorimetry, and polarized optical microscopy.
