1.
Appl Radiat Isot
; 121: 71-75, 2017 Mar.
Article
in English
| MEDLINE
| ID: mdl-28038409
ABSTRACT
In the paper a manufacturing process of three-dimensional (3D) microchannel structure by silicon (Si) anodic etching was discussed. The possibility of microchannels formation allows to increase the active area more than 100 times. In this structure the p-n junction on the whole Si surface was formed. The obtained data allowed to evaluate the characteristics of the betavoltaic converter with a 3D structure by using isotope 63Ni with a specific activity of 10Ci/g.