Microtags with 150-nm line gratings fabricated by use of extreme-ultraviolet lithography.

The microtag concept is an anticounterfeiting and security measure. Microtags are computer-generated holograms (CGH's) consisting of 150-nm lines arranged to form 300-nm-period gratings. The microtags that we describe were designed for readout at 442nm . The smallest microtag measures 56micromx80 microm when viewed at normal incidence. The CGH design process uses a modified iterative Fourier-transform algorithm to create either phase-only or phase-and-amplitude microtags. We also report on a simple and compact readout system for recording the diffraction pattern formed by a microtag. The measured diffraction patterns agree very well with predictions.

Mass-producible microscopic computer-generated holograms: microtags.

We have developed a method for encoding phase and amplitude in microscopic computer-generated holograms (microtags) for security applications. An 8 x 8 cell phase-only and an 8 x 8 cell phase-and-amplitude microtag design has been exposed in photoresist by the extreme-ultraviolet (13.4-nm) lithography tool developed at Sandia National Laboratories. Each microtag measures 80 microm x 160 microm and contains features that are 0.2 microm wide. Fraunhofer zone diffraction patterns can be obtained from fabricated microtags without any intervening optics and compare favorably with predicted diffraction patterns.

Soft-x-ray projection lithography experiments using Schwarzschild imaging optics.

Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterized and correlated with imaging performance. A new Schwarzschild housing, designed for improved alignment stability, is described.

Diffraction-limited soft-x-ray projection imaging using a laser plasma source.

Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-microm lines and spaces is observed in polymethylmethacrylate.