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Appl Microbiol Biotechnol ; 53(4): 476-9, 2000 Apr.
Article in English | MEDLINE | ID: mdl-10803906

ABSTRACT

The combined effect of redox potential (RP) (from -200 to 500 mV) and pH (from 5.0 to 7.0) on the heat resistance and growth recovery after heat treatment of Escherichia coli was tested. The effect of RP on heat resistance was very different depending on the pH. At pH 6.0, there was no significant difference, whereas at pH 5.0 and 7.0 maximum resistance was found in oxidizing conditions while it fell in reducing ones. In sub-lethally heat-damaged cells, low reducing and acid conditions allowed growth ability to be rapidly regained, but a decrease in the redox potential and pH brought about a longer lag phase and a slower exponential growth rate, and even led to growth failure (pH 5.0, < or =-100 mV).


Subject(s)
Escherichia coli/growth & development , Hot Temperature , Culture Media , Hydrogen-Ion Concentration , Oxidation-Reduction
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