ABSTRACT
We have examined the influence of flake-substrate effects that affect one and few layers of MoS2 in terms of their electrical and optical properties. In the measurements, we used SiO2/Si substrates with etched cavities and aluminum electrodes. Suspended areas are easily identifiable both on images depicting the topography and on the surface potential maps measured with the Kelvin probe force microscopy. Compared to the SiO2/Si supported material, surface potential decrease is observable at the membrane. The surface potential value of the flakes located on the electrodes is the lowest. PL measurements prove that single MoS2 monolayer was obtained. Suspended regions are also correlated with maps obtained as a result of Raman spectroscopy.
ABSTRACT
PURPOSE: The surface roughness of the dental restorations is significant to the denture plaque adhesion. METHODS: In this work, we present the complex analysis of the electropolished CoCrW alloy remanium® star (Dentaurum, Germany) samples with laserengraved fiducial marks performed using complementary set of micro- and nanoscopic techniques: optical profilometry (OP), atomic force microscopy (AFM), scanning electron microscopy (SEM) and focused ion beam (FIB) milling. RESULTS: Both mean and RMS roughness of the samples were reduced by electopolishing process, however, the results obtained using OP and AFM exhibited some discrepancies. This was caused by the relatively high local protruding defects developed on the processed surface. The cross-sections of the protrusions were made to analyze the cause of their formation as the EDS elemental content maps revealed that their composition was uniform. We also analyzed the local roughness in the smaller areas free from the defects. CONCLUSIONS: In that case, both OP and AFM techniques delivered the same results. Analysis of results showed that various methods used for the surface roughness evaluation have to be used simultaneously to obtain complete and true analysis of the technological CoCrW samples.
