ABSTRACT
The quality of topographic images obtained using atomic force microscopy strongly depends on the accuracy of the choice of scanning parameters. When using the most common scanning method - semicontact amplitude modulation (tapping) mode, the choice of scanning parameters is quite complicated, since it requires taking into account many factors and finding the optimal balance between them. A researcher's task can be significantly simplified by introducing new scanning techniques. Two such techniques are described: vertical and dissipation modes. Significantly simplified and formalized choice of the imaging parameters in these modes allows addressing a wide range of formerly challenging tasks - from scanning rough samples with high aspect ratio features to molecular resolution imaging.
ABSTRACT
We propose a novel, to the best of our knowledge, technique for magnetoplasmonic nanostructures fabrication based on the pulse force nanolithography method. It allows one to create the high-quality magnetoplasmonic nanostructures that have lower total losses than the gratings made by the electron-beam lithography. The method provides control of the surface plasmon polaritons excitation efficiency by varying the grating parameters such as the scratching depth or the number of scratches in a single period. The quality of the plasmonic gratings was estimated by means of the transverse magneto-optical Kerr effect that is extremely sensitive to the finesse of a plasmonic structure.