MoS2/Graphene Photodetector Array with Strain-Modulated Photoresponse up to the Near-Infrared Regime.

MoS2, an emerging material in the field of optoelectronics, has attracted the attention of researchers owing to its high light absorption efficiency, even as an atomically thin layer. However, the covered spectra of the reported MoS2-based photodetectors are restricted to the visible range owing to their electronic bandgap (∼1.9 eV). Strain engineering, which modulates the bandgap of a semiconductor, can extend the application coverage of MoS2 to the infrared spectral range. The shrinkage of the bandgap because of the tensile strain on MoS2 enhances the photoresponsivity in the visible range and extends its sensing capability beyond its fundamental absorption limit. Herein, we report a graphene/MoS2/graphene metal-semiconductor-metal photodetector (PD) array with a strain-modulated photoresponse up to the spectral range of the near-infrared (NIR). The MoS2 PD array on a flexible substrate was stretched in the biaxial direction to a tensile strain level of 1.19% using a pneumatic bulging process. The MoS2-based line-scanning system was implemented by digitizing the output photocurrent of the strained MoS2 linear array with a low-noise complementary metal-oxide-semiconductor (CMOS) readout integrated circuit (IC) and successfully captured vis-NIR images in foggy conditions. Therefore, we extended the application of the MoS2 PD array to the NIR regime and demonstrated its use in real-life imaging systems.

Breaking the absorption limit of Si toward SWIR wavelength range via strain engineering.

Silicon has been widely used in the microelectronics industry. However, its photonic applications are restricted to visible and partial near-infrared spectral range owing to its fundamental optical bandgap (1.12 eV). With recent advances in strain engineering, material properties, including optical bandgap, can be tailored considerably. This paper reports the strain-induced shrinkage in the Si bandgap, providing photosensing well beyond its fundamental absorption limit in Si nanomembrane (NM) photodetectors (PDs). The Si-NM PD pixels were mechanically stretched (biaxially) by a maximum strain of ~3.5% through pneumatic pressure-induced bulging, enhancing photoresponsivity and extending the Si absorption limit up to 1550 nm, which is the essential wavelength range of the lidar sensors for obstacle detection in self-driving vehicles. The development of deformable three-dimensional optoelectronics via gas pressure-induced bulging also facilitated the realization of unique device designs with concave and convex hemispherical architectures, which mimics the electronic prototypes of biological eyes.