1.
Rapid Commun Mass Spectrom
; 27(24): 2828-32, 2013 Dec 30.
Article
in English
| MEDLINE
| ID: mdl-24214870
2.
Nanotechnology
; 24(1): 015708, 2013 Jan 11.
Article
in English
| MEDLINE
| ID: mdl-23221362
ABSTRACT
We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of ≈5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure (24)Mg(+) and (64)Zn(+) intensities as a function of sample depth. Analysis of depth profiles by the mixing-roughness-information model yields a 1.5 nm nanolayer interfacial roughness within the MgO/ZnO multilayer. This finding was cross-validated using specular x-ray reflectivity. Such an analysis further suggested that the 1.5 nm roughness corresponds to native/jig-sawed interfacial roughness rather than interfacial interdiffusion during the ALD growth.