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1.
Opt Express ; 16(26): 21339-54, 2008 Dec 22.
Article in English | MEDLINE | ID: mdl-19104564

ABSTRACT

A new Mueller matrix polarimeter was used to image the retinas of normal subjects. Light from a linearly polarized 780 nm laser was passed through a system of variable retarders and scanned across the retina. Light returned from the eye passed through a second system of retarders and a polarizing beamsplitter to two confocal detection channels. Optimization of the polarimetric data reduction matrix was via a condition number metric. The accuracy and repeatability of polarization parameter measurements were within +/- 5%. The magnitudes and orientations of retardance and diattenuation, plus depolarization, were measured over 15 degrees of retina for 15 normal eyes.


Subject(s)
Diagnostic Techniques, Ophthalmological , Optics and Photonics , Retina/anatomy & histology , Retina/physiology , Vision, Ocular , Algorithms , Calibration , Diagnostic Imaging/methods , Equipment Design , Humans , Light , Microscopy, Polarization/methods , Models, Statistical , Ocular Physiological Phenomena , Optic Nerve/anatomy & histology , Reproducibility of Results
2.
Opt Express ; 16(15): 11589-603, 2008 Jul 21.
Article in English | MEDLINE | ID: mdl-18648480

ABSTRACT

Methods are presented for optimizing the design of Mueller matrix polarimeters and and in particular selecting the retardances and orientation angles of polarization components to ensure accurate reconstruction of a sample's Mueller matrix in the presence of error sources. Metrics related to the condition number and to the singular value decomposition are used to guide the design process for Mueller matrix polarimeters with the goal of specifying polarization elements, comparing polarimeter configurations, estimating polarimeter errors, and compensating for known error sources. The use of these metrics is illustrated with analyses of two example polarimeters: a dual rotating retarder polarimeter, and a dual variable retarder polarimeter.


Subject(s)
Algorithms , Artifacts , Photometry/instrumentation , Photometry/methods , Refractometry/instrumentation , Refractometry/methods , Equipment Design , Equipment Failure Analysis , Quality Control , Reproducibility of Results , Sensitivity and Specificity
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