ABSTRACT
A desktop-sized ion beam processing system with an inexpensive electron cyclotron resonance (ECR) ion source has been developed for industrial applications at the National Institute of Technology, Toyama College. A commercially available 1.2- to 1.3-GHz transceiver is adopted as a microwave source to generate the ECR plasma. The minimum-B magnetic field is formed by arranging small rectangular permanent magnets. A Wien filter with orthogonal electric and magnetic fields is employed as a beam separator. At the end of the beam line, a processing chamber with a substrate stage for ion beam applications, such as ion implantation and microfabrication, is installed. Here, we report the results of the first experiment. Ar ion beams with a current of approximately 62 µA were obtained at an extraction voltage of 4 kV. In addition, we demonstrate that Ar and Xe ions can be separated by the Wien filter.
