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J Nanosci Nanotechnol ; 13(11): 7561-7, 2013 Nov.
Article in English | MEDLINE | ID: mdl-24245292

ABSTRACT

Thin ZrO2/Al2O3 films that consisted of alternating monoclinic ZrO2 nanolayers and amorphous Al2O3 nanolayers were deposited on a tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system, and then oxidized at 600-900 degrees C in air for up to 50 h. The ZrO2/Al2O3 films effectively suppressed the oxidation of the substrate up to 800 degrees C by acting as a barrier layer against the outward diffusion of the substrate elements and inward diffusion of oxygen. However, rapid oxidation occurred at 900 degrees C due mainly to the increased diffusion and subsequent oxidation of steel as well as the crystallization of amorphous Al2O3.


Subject(s)
Aluminum/chemistry , Membranes, Artificial , Metal Nanoparticles/chemistry , Metal Nanoparticles/ultrastructure , Plasma Gases/chemistry , Steel/chemistry , Zirconium/chemistry , Adsorption , Crystallization/methods , Heating/methods , Macromolecular Substances/chemistry , Materials Testing , Molecular Conformation , Oxidation-Reduction , Particle Size , Surface Properties
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