Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer.

Polyphthalaldehyde is a self-developing resist material for electron beam and thermal scanning probe lithography (t-SPL). Removing the resist in situ (during the lithography process itself) simplifies processing and enables direct pattern inspection, however, at the price of a low etch resistance of the resist. To convert the material into a etch resistant hard mask, we study the selective cyclic infiltration of trimethyl-aluminum (TMA)/water into polyphthalaldehyde. It is found that TMA diffuses homogeneously through the resist, leading to material expansion and formation of aluminum oxide concurrent to the exposure to water and the degradation of the polyphthalaldehyde polymer. The plasma etch resistance of the infiltrated resist is significantly improved, as well as its stability. Using a silicon substrate coated with 13 nm silicon nitride and 7 nm cross-linked polystyrene, high resolution polyphthalaldehyde patterning is performed using t-SPL. After TMA/H2O infiltration, it is demonstrated that pattern transfer into silicon can be achieved with good fidelity for structures as small as 10 nm, enabling >10× amplification and low surface roughness. The presented results demonstrate a simplified use of polyphthalaldehyde resist, targeting feature scales at nanometer range, and suggest that trimethyl-aluminum infiltration can be applied to other resist-based lithography techniques.

In-situ ATR-FTIR for dynamic analysis of superhydrophobic breakdown on nanostructured silicon surfaces.

Superhydrophobic surfaces are highly promising for self-cleaning, anti-fouling and anti-corrosion applications. However, accurate assessment of the lifetime and sustainability of super-hydrophobic materials is hindered by the lack of large area characterization of superhydrophobic breakdown. In this work, attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) is explored for a dynamic study of wetting transitions on immersed superhydrophobic arrays of silicon nanopillars. Spontaneous breakdown of the superhydrophobic state is triggered by in-situ modulation of the liquid surface tension. The high surface sensitivity of ATR-FTIR allows for accurate detection of local liquid infiltration. Experimentally determined wetting transition criteria show significant deviations from predictions by classical wetting models. Breakdown kinetics is found to slow down dramatically when the liquid surface tension approaches the transition criterion, which clearly underlines the importance of more accurate wetting analysis on large-area surfaces. Precise actuation of the superhydrophobic breakdown process is demonstrated for the first time through careful modulation of the liquid surface tension around the transition criterion. The developed ATR-FTIR method can be a promising technique to study wetting transitions and associated dynamics on various types of superhydrophobic surfaces.

Superhydrophobic Breakdown of Nanostructured Surfaces Characterized in Situ Using ATR-FTIR.

In situ characterization of the underwater stability of superhydrophobic micro- and nanostructured surfaces is important for the development of self-cleaning and antifouling materials. In this work, we demonstrate a novel attenuated total reflectance-Fourier transform infrared (ATR-FTIR) spectroscopy-based method for large-area wetting characterization of silicon nanopillars. When air is present in between the structures, as is characteristic of the Cassie-Baxter state, the relative intensities of the water bands in the absorption spectrum change because of the wavelength-dependent attenuation of the evanescent wave. This phenomenon enables unambiguous identification of the wetting state and assessment of liquid impalement. Using mixtures of isopropanol and water with different concentrations, the breakdown of superhydrophobic states and the wetting hysteresis effects are systematically studied on uniform arrays of silicon nanopillars. A transition from the Cassie-Baxter to Wenzel state is observed when the isopropanol concentration exceeds 2.8 mol %, corresponding to a critical surface tension of 39 mN/m. Spontaneous dewetting does not occur upon decreasing the isopropanol concentration, and pure water can be obtained in a stable Wenzel state on the originally superhydrophobic substrates. The developed ATR-FTIR method can be promising for real-time monitoring of the wetting kinetics on nanostructured surfaces.

Full wetting of plasmonic nanopores through two-component droplets.

Benefiting from the prospect of extreme light localization, plasmonic metallic nanostructures are bringing advantages in many applications. However, for use in liquids, the hydrophobic nature of the metallic surface inhibits full wetting, which is related to contact line pinning in the nanostructures. In this work, we use a two-component droplet to overcome this problem. Due to a strong internal flow generated from the solutal Marangoni effect, these droplets can easily prime metallic nanostructures including sub-10 nm nanopores. We subsequently evaluate the local wetting performance of the plasmonic structures using surface enhanced Raman spectroscopy (SERS). Compared with other commonly used surface cleaning based wetting methods such as the oxygen plasma treatment, our two-component drop method is an efficient method in resolving the pinning of contact lines and is also non-destructive to samples. Thus the method described here primes plasmonic devices with guaranteed performances in liquid applications.

High-frequency acoustic for nanostructure wetting characterization.

Nanostructure wetting is a key problem when developing superhydrophobic surfaces. Conventional methods do not allow us to draw conclusions about the partial or complete wetting of structures on the nanoscale. Moreover, advanced techniques are not always compatible with an in situ, real time, multiscale (from macro to nanoscale) characterization. A high-frequency (1 GHz) acoustic method is used for the first time to characterize locally partial wetting and the wetting transition between nanostructures according to the surface tension of liquids (the variation is obtained by ethanol concentration modification). We can see that this method is extremely sensitive both to the level of liquid imbibition and to the impalement dynamic. We thus demonstrate the possibility to evaluate the critical surface tension of a liquid for which total wetting occurs according to the aspect ratio of the nanostructures. We also manage to identify intermediate states according to the height of the nanotexturation. Finally, our measurements revealed that the drop impalement depending on the surface tension of the liquid also depends on the aspect ratio of the nanostructures. We do believe that our method may lead to new insights into nanoscale wetting characterization by accessing the dynamic mapping of the liquid imbibition under the droplet.

Capturing wetting states in nanopatterned silicon.

Spectacular progress in developing advanced Si circuits with reduced size, along the track of Moore's law, has been relying on necessary developments in wet cleaning of nanopatterned Si wafers to provide contaminant free surfaces. The most efficient cleaning is achieved when complete wetting can be realized. In this work, ordered arrays of silicon nanopillars on a hitherto unexplored small scale have been used to study the wetting behavior on nanomodulated surfaces in a substantial range of surface treatments and geometrical parameters. With the use of optical reflectance measurements, the nanoscale water imbibition depths have been measured and the transition to the superhydrophobic Cassie-Baxter state has been accurately determined. For pillars of high aspect ratio (about 15), the transition occurs even when the surface is grafted with a hydrophilic functional group. We have found a striking consistent deviation between the contact angle measurements and the straightforward application of the classical wetting models. Molecular dynamics simulations show that these deviations can be attributed to the long overlooked atomic-scale surface perturbations that are introduced during the nanofabrication process. When the transition condition is approached, transient states of partial imbibition that characterize intermediate states between the Wenzel and Cassie-Baxter states are revealed in our experiments.