Gate-controlled rectifying barrier in a two-dimensional hole gas.

The current flowing in a homogeneous low-dimensional conductor is shown to be rectified by a gate-controlled asymmetric barrier resembling a Schottky barrier. The barrier shape is set by varying the potential along a nanofabricated nonequipotential gate which allows simple external control over the device function independent of material properties. A forward-to-reverse current ratio of more than 10(4) is obtained. The merits of diodes fabricated in this way with respect to conventional diodes are discussed.

Atomic-scale pathway of the pyramid-to-dome transition during ge growth on Si(001).

By high resolution scanning tunneling microscopy, we investigate the morphological transition from pyramid to dome islands during the growth of Ge on Si(001). We show that pyramids grow from top to bottom and that, from a critical size on, incomplete facets are formed. We demonstrate that the bunching of the steps delimiting these facets evolves into the steeper dome facets. Based on first principles and Tersoff-potential calculations, we develop a microscopic model for the onset of the morphological transition, able to reproduce closely the experimentally observed behavior.

Morphological and compositional evolution of the ge/si(001) surface during exposure to a si flux.

By using scanning tunneling microscopy we found that the surface reconstruction of Ge/Si(001) epilayers evolves from (M x N) to (2 x N), and eventually to (2 x 1), during exposure to a Si flux. This sequence appears to be just the inverse of that observed during the growth of Ge or SiGe alloys on Si(001). However, molecular dynamics simulations supported by ab initio calculations allow us to interpret this morphological evolution in terms of Si migration through the epilayer and complex Si-Ge intermixing below the top Ge layer.

Barrierless formation and faceting of SiGe islands on Si(001).

The initial stages of the formation of SiGe islands on Si(001) pose a long-standing puzzle. We show that the behavior can be consistently explained by one simple assumption-that for strained SiGe, (001) is a stable orientation but not a facet orientation. Calculations of energy and morphology reproduce the key features of "prepyramid" and "pyramid" islands, and explain the initial formation and subsequent shape transition. Scanning tunneling microscopy measurements confirm the key assumptions and predictions of the model.

Critical role of the surface reconstruction in the thermodynamic stability of (105) Ge pyramids on Si(001).

We show by molecular dynamics simulations on a scale comparable to experimental dimensions that a peculiar surface reconstruction of the (105) facets is responsible for the stability of Ge pyramids on Si(001). This finding is confirmed by ab initio total energy calculations for competing surface reconstructions and a very satisfactory comparison of the corresponding charge density maps to scanning tunneling microscopy measurements of the facets, both for filled and empty states.

Reversible shape evolution of Ge islands on Si(001).

The evolution of strained Ge/Si(001) islands during exposure to a Si flux was investigated by scanning tunneling microscopy. Dome islands display appreciable shape changes at Si coverages as low as 0.5 monolayer. With increasing coverage, they transform into [105]-faceted pyramids, and eventually into stepped mounds with steps parallel to the <110> directions. These morphological changes are induced by alloying and represent a complete reversal of those previously observed during Ge island growth. The results are interpreted with a simple model in which the equilibrium shape of an island mainly depends on its volume and composition.

D(A) steps and 2D islands of double layer height in the SiGe(001) system

The surfaces of step graded, partially relaxed Si(1-x)Ge(x)/Si(001) buffers were studied by scanning tunneling microscopy. The surface slips along <110> forming the crosshatch pattern, consisting of bunches of D(A) steps of double layer height. The D(A) steps are present in regions of large surface gradients close to the slips, as well as in planar regions between the slips. These regions are also characterized by the appearance of 2D islands of double layer height. The observations can be explained by assuming the strain due to the misfit dislocations to be locally anisotropic. Anisotropic misfit strain and efficient strain relaxation by the ( 2x8) Ge reconstruction were identified as the main factors causing the unusual step structure.

Electron and hole focusing in CoSi2/Si(111) observed by ballistic electron emission microscopy

In ballistic electron emission microscopy (BEEM) the propagation of hot carriers in thin metal films has long been treated using a free electron model. While the model explains many experimental findings, it cannot account for the lateral resolution observed for both electrons and holes on epitaxial CoSi(2)/Si(111), where interfacial point defects of atomic size appear as small as 1.3 nm, even below a 5.6 nm thick film. We present ab initio calculations explaining this high resolution in terms of conduction (valence) band structure focusing of electrons (holes), according to a recent Green's function approach to the BEEM process.