Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography.

Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact table-top set up.

Volume extreme ultraviolet nano-holographic imaging with numerical optical sectioning.

Three dimensional images were obtained using a single high numerical aperture hologram recorded in a high resolution photoresist with a table top lambda = 46.9 nm laser. Gabor holograms were numerically reconstructed over a range of image planes by sweeping the propagation distance in the numerical reconstruction algorithm, allowing numerical optical sectioning. A robust three dimension image of a test object was obtained with numerical optical sectioning, providing a longitudinal resolution of approximately 2 mum and a lateral resolution of 164 nm.

Sub 400 nm spatial resolution extreme ultraviolet holography with a table top laser.

We report sub-400 nm spatial resolution with Gabor holography obtained using a highly coherent table top 46.9 nm laser. The hologram was recorded in high resolution photoresist and subsequently digitized with an atomic force microscope. The final image was numerically reconstructed with a Fresnel propagator. Optimal reconstruction parameters and quantification of spatial resolution were obtained with a wavelet analysis and image correlation.