Synthesis of SnTe nanoplates with {100} and {111} surfaces.

SnTe is a topological crystalline insulator that possesses spin-polarized, Dirac-dispersive surface states protected by crystal symmetry. Multiple surface states exist on the {100}, {110}, and {111} surfaces of SnTe, with the band structure of surface states depending on the mirror symmetry of a particular surface. Thus, to access surface states selectively, it is critical to control the morphology of SnTe such that only desired crystallographic surfaces are present. Here, we grow SnTe nanostructures using vapor-liquid-solid and vapor-solid growth mechanisms. Previously, SnTe nanowires and nanocrystals have been grown [Saghir et al. Cryst. Growth Des. 2014, 14, 2009-2013; Safdar et al. Cryst. Growth Des. 2014, 14, 2502-2509; Safdar et al. Nano Lett. 2013, 13, 5344-5349; Li et al. Nano Lett. 2013, 13, 5443-5448]. In this report, we demonstrate the synthesis of SnTe nanoplates with lateral dimensions spanning tens of micrometers and thicknesses of a few hundred nanometers. The top and bottom surfaces are either (100) or (111), maximizing topological surface states on these surfaces. Magnetotransport on these SnTe nanoplates shows a high bulk carrier density, consistent with bulk SnTe crystals arising due to defects such as Sn vacancies. In addition, we observe a structural phase transition in these nanoplates from the high-temperature rock salt to a low-temperature rhombohedral structure. For nanoplates with a very high carrier density, we observe a slight upturn in resistance at low temperatures, indicating electron-electron interactions.

Combinatorial development of bulk metallic glasses.

The identification of multicomponent alloys out of a vast compositional space is a daunting task, especially for bulk metallic glasses composed of three or more elements. Despite an increasing theoretical understanding of glass formation, bulk metallic glasses are predominantly developed through a sequential and time-consuming trial-and-error approach. Even for binary systems, accurate quantum mechanical approaches are still many orders of magnitude away from being able to simulate the relatively slow kinetics of glass formation. Here, we present a high-throughput strategy where ∼3,000 alloy compositions are fabricated simultaneously and characterized for thermoplastic formability through parallel blow forming. Using this approach, we identified the composition with the highest thermoplastic formability in the glass-forming system Mg-Cu-Y. The method provides a versatile toolbox for unveiling complex correlations of material properties and glass formation, and should facilitate a drastic increase in the discovery rate of metallic glasses.

Crystalline oxides on silicon.

This review outlines developments in the growth of crystalline oxides on the ubiquitous silicon semiconductor platform. The overall goal of this endeavor is the integration of multifunctional complex oxides with advanced semiconductor technology. Oxide epitaxy in materials systems achieved through conventional deposition techniques is described first, followed by a description of the science and technology of using atomic layer-by-layer deposition with molecular beam epitaxy (MBE) to systematically construct the oxide-silicon interface. An interdisciplinary approach involving MBE, advanced real-space structural characterization, and first-principles theory has led to a detailed understanding of the process by which the interface between crystalline oxides and silicon forms, the resulting structure of the interface, and the link between structure and functionality. Potential applications in electronics and photonics are also discussed.

Ferroelectric field effect transistors for memory applications.

The non-volatile polarization of a ferroelectric is a promising candidate for digital memory applications. Ferroelectric capacitors have been successfully integrated with silicon electronics, where the polarization state is read out by a device based on a field effect transistor configuration. Coupling the ferroelectric polarization directly to the channel of a field effect transistor is a long-standing research topic that has been difficult to realize due to the properties of the ferroelectric and the nature of the interface between the ferroelectric and the conducting channel. Here, we report on the fabrication and characterization of two promising capacitor-less memory architectures.