Degradation of high-concentration simulated organic wastewater by DBD plasma.

In this study, a high-concentration simulated organic wastewater, made by dissolving methyl violet in water, was degraded using dielectric barrier discharge (DBD) plasma generated in air and O2 respectively. The decoloration rate and chemical oxygen demand (COD) of wastewater were evaluated during plasma treatments with the initial concentration of methyl violet of 300 mg L-1. Results showed that the highest decoloration rate of around 100% within 10 min and the highest COD decrease of 33% within 60 min could be achieved with the O2 plasma treatment at the discharge voltage of 10 kV, while air plasma treatment showed lower efficiency in decolorizing the methyl violet solution and lower COD decrease (24%) after 60 min treatment. UV-Vis spectroscopy and chemical analysis of generated by-products during the plasma-enabled degradation process revealed that the methyl violet molecules could be completely decomposed into some refractory organics in the solution. Based on the experimental results and literature review, a pathway of methyl violet degradation attributed to energetic electrons and highly reactive species generated by DBD was proposed.

Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma.

Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides or hormones. While the beneficial effects of plasma treatment on seed germination, disease resistance and agricultural output have been reported, the mechanisms that underpin the observed biological responses are yet to be fully described. This study employs Fourier Transform Infrared (FTIR) spectroscopy and emission spectroscopy to capture chemical interactions between plasmas and seed surfaces with the aim to provide a more comprehensive account of plasma-seed interactions. FTIR spectroscopy of the seed surface confirms plasma-induced chemical etching of the surface. The etching facilitates permeation of water into the seed, which is confirmed by water uptake measurements. FTIR of exhaust and emission spectra of discharges show oxygen-containing species known for their ability to stimulate biochemical processes and deactivate pathogenic microorganisms. In addition, water gas, CO2, CO and molecules containing -C(CH3)3- moieties observed in FTIR spectra of the exhaust gas during plasma treatment may be partly responsible for the plasma chemical etching of seed surface through oxidizing the organic components of the seed coat.

Non-equilibrium plasma prevention of Schistosoma japonicum transmission.

Schistosoma japonicum is a widespread human and animal parasite that causes intestinal and hepatosplenic schistosomiasis linked to colon, liver and bladder cancers, and anemia. Estimated 230 million people are currently infected with Schistosoma spp, with 779 million people at risk of contracting the parasite. Infection occurs when a host comes into contact with cercariae, a planktonic larval stage of the parasite, and can be prevented by inactivating the larvae, commonly by chemical treatment. We investigated the use of physical non-equilibrium plasma generated at atmospheric pressure using custom-made dielectric barrier discharge reactor to kill S. japonicum cercariae. Survival rate decreased with treatment time and applied power. Plasmas generated in O2 and air gas discharges were more effective in killing S. japonicum cercariae than that generated in He, which is directly related to the mechanism by which cercariae are inactivated. Reactive oxygen species, such as O atoms, abundant in O2 plasma and NO in air plasma play a major role in killing of S. japonicum cercariae via oxidation mechanisms. Similar level of efficacy is also shown for a gliding arc discharge plasma jet generated in ambient air, a system that may be more appropriate for scale-up and integration into existing water treatment processes.

[The study of infrared absorption spectrum of diamond during growth by FTIR].

The diamond thin films were deposited on silicon substrates under invariable conditions of process pressure, substrate temperature negative direct-current (dc) bias of substrate and microwave power while the rations of methane (CH4) to hydrogen (H2) changing from 3% to 5% and 9% using electron-cyclotron-resonance microwave plasma-assisted chemical vapor deposition technique (ECRCVD). In situ Fourier transform infrared spectroscopy (FTIR) have been used to study the plasma species absorbed on the substrate surfaces as well as the species above the substrates surfaces both before and during the nucleation and film growth. It is demonstrated that these techniques can provide useful information on the early stages of diamond growth. When correlated with film properties measured by Raman spectroscopy and scanning electron microscopy, the results from FTIR indicate that the absorption of the graphitic and diamond phases are related to the ratio of CH4 to H2 and can be identified at the early stages of film growth.