Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO2/Al2O3-Based Charge Trapping Layers.

Flash memories are the preferred choice for data storage in portable gadgets. The charge trapping nonvolatile flash memories are the main contender to replace standard floating gate technology. In this work, we investigate metal/blocking oxide/high-k charge trapping layer/tunnel oxide/Si (MOHOS) structures from the viewpoint of their application as memory cells in charge trapping flash memories. Two different stacks, HfO2/Al2O3 nanolaminates and Al-doped HfO2, are used as the charge trapping layer, and SiO2 (of different thickness) or Al2O3 is used as the tunneling oxide. The charge trapping and memory windows, and retention and endurance characteristics are studied to assess the charge storage ability of memory cells. The influence of post-deposition oxygen annealing on the memory characteristics is also studied. The results reveal that these characteristics are most strongly affected by post-deposition oxygen annealing and the type and thickness of tunneling oxide. The stacks before annealing and the 3.5 nm SiO2 tunneling oxide have favorable charge trapping and retention properties, but their endurance is compromised because of the high electric field vulnerability. Rapid thermal annealing (RTA) in O2 significantly increases the electron trapping (hence, the memory window) in the stacks; however, it deteriorates their retention properties, most likely due to the interfacial reaction between the tunneling oxide and the charge trapping layer. The O2 annealing also enhances the high electric field susceptibility of the stacks, which results in better endurance. The results strongly imply that the origin of electron and hole traps is different-the hole traps are most likely related to HfO2, while electron traps are related to Al2O3. These findings could serve as a useful guide for further optimization of MOHOS structures as memory cells in NVM.

TEM Observations of the Microstructural Changes in the Interfacial Zone of Explosively Welded Titanium/Steel Before and After Ex Situ and In Situ Heat Treatment.

This paper presents the comparison of the microstructure of the interface zone formed between titanium (Ti Gr. 1) and steel (P265GH+N) in various processing stages­directly after explosive welding versus the annealing state. Transmission electron microscopy technique served as an excellent tool for studies of the sharp interface in-between the waves. Directly after the welding process in this area, a thin layer of the metastable ß-Ti (Fe) solid solution was observed. In the next step, two variants of annealing have been employed: ex situ and in situ in TEM, which revealed the complete information on the interface zone transformation. The results have shown that during the annealing at 600°C for 1.5 h, the diffusion of carbon towards titanium caused the formation of titanium carbides with a layered arrangement. Compared to our previous studies, the carbides found here have a hexagonal structure. Furthermore, changes in the dislocation structure were observed, indicating the occurrence of recovery processes. Possible reasons for differences observed in the microstructure of the interface formed due to ex situ and in situ annealing are also discussed. The microstructure observations are accompanied by the microhardness measurements, which showed that the annealing caused a significant reduction in the microhardness values.

Microstructural Characterization of Nb/Inconel 601 Interface Obtained in the Explosive Welding Process.

This work presents the microstructure of the cross-section of a newly developed Nb/Inconel 601 weld with particular attention paid to the continuity, morphology of the interface, and the microstructural changes within its vicinity. Both scanning (SEM) and transmission (TEM) electron microscopy techniques are excellent tools to analyze the microstructure that affects both mechanical and corrosion resistance properties of the obtained product. Grain size examination and their orientation together with the character of grain boundaries by the electron backscattered diffraction (EBSD) technique were performed followed by chemical composition determination across the interface with energy-dispersive X-ray spectroscopy (EDS) in SEM. Then, the microstructure observations of the mixed region located at the Nb/Inconel 601 interface using the TEM technique allowed its chemical and phase composition to be revealed.

On the Disintegration of A1050/Ni201 Explosively Welded Clads Induced by Long-Term Annealing.

The paper presents the microstructure and phase composition of the interface zone formed in the explosive welding process between technically pure aluminum and nickel. Low and high detonation velocities of 2000 and 2800 m/s were applied to expose the differences of the welded zone directly after the joining as well as subsequent long-term annealing. The large amount of the melted areas was observed composed of a variety of Al-Ni type intermetallics; however, the morphology varied from nearly flat to wavy with increasing detonation velocity. The applied heat treatment at 500 °C has resulted in the formation of Al3Ni and Al3Ni2 layers, which in the first stages of growth preserved the initial interface morphology. Due to the large differences in Al and Ni diffusivities, the porosity formation occurred for both types of clads. Faster consumption of Al3Ni phase at the expense of the growing Al3Ni2 phase, characterized by strong crystallographic texture, has been observed only for the weld obtained at low detonation velocity. As a result of the extended annealing time, the disintegration of the bond occurred due to crack propagation located at the A1050/Al3Ni2 interface.

Growth Kinetics of the Selected Intermetallic Phases in Ni/Al/Ni System with Various Nickel Substrate Microstructure.

Reactivity in nickel⁻aluminum system was examined for two variants of nickel substrates in terms of the size and shape of Ni grains. The microstructure transformation aroused due to the annealing at 720 °C for different annealing times (0.25 to 72 h) was consequently followed. The sequence of formation of the particular intermetallic phases was given. The interconnection zones were examined by means of scanning electron microscopy supported with energy dispersive X-ray spectroscopy and electron backscattered diffraction techniques as well as by the transmission electron microscopy. The growth kinetics data for AlNi, AlNiNi-rich and AlNi3 phases for both variants of substrates was given, indicating the differences obtained in previous works on this subject.