ABSTRACT
To keep pace with the shrinkage of critical dimension, source and mask optimization (SMO) has emerged as a promising resolution enhancement technique to push the resolution of 193 nm argon fluoride immersion lithography systems. However, most current pixelated SMO approaches relied on scalar imaging models that are no longer accurate for immersion lithography systems with hyper-NA (NA>1). This paper develops a robust hybrid SMO (HSMO) algorithm based on a vector imaging model capable of effectively improving the robustness of immersion lithography systems to defocus and dose variations. The proposed HSMO algorithm includes two steps. First, the individual source optimization approach is carried out to rapidly reduce the cost function. Subsequently, the simultaneous SMO approach is applied to further improve the process robustness by exploiting the synergy in the joint optimization of source and mask patterns. The conjugate gradient method is used to update the source and mask pixels. In addition, a source regularization approach and source postprocessing are both used to improve the manufacturability of the optimized source patterns. Compared to the mask optimization method, the HSMO algorithm achieves larger process windows, i.e., extends the depth of focus and exposure latitude, thus more effectively improving the process robustness of 45 nm immersion lithography systems.
ABSTRACT
A dynamic diffuse double-layer model is developed for describing the electrode/electrolyte interface bearing a redox reaction. It overcomes the dilemma of the traditional voltammetric theories based on the depletion layer and Frumkin's model for double-layer effects in predicating the voltammetric behavior of nanometer-sized electrodes. Starting from the Nernst-Planck equation, a dynamic interfacial concentration distribution is derived, which has a similar form to the Boltzmann distribution equation but contains the influence of current density. Incorporation of the dynamic concentration distribution into the Poisson and Butler-Volmer equations, respectively, produces a dynamic potential distribution equation containing the influence of current and a voltammetric equation containing the double-layer effects. Computation based on these two equations gives both the interfacial structure (potential and concentration profiles) and voltammetric behavior. The results show that the electrochemical interface at electrodes of nanometer scales is more like an electric-double-layer, whereas the interface at electrodes larger than 100 nm can be treated as a concentration depletion layer. The double-layer nature of the electrode/electrolyte interface of nanometer scale causes the voltammetric responses to vary with electrode size, reactant charge, the value of formal redox potential, and the dielectric properties of the compact double-layer. These voltammetric features are novel in comparison to the traditional voltammetric theory based on the transport of redox molecules in the depletion layer.
ABSTRACT
A novel electrophoresis technique, in which the separation column was replaced by a strip of Nafion membrane (5.0 cm x 0.20 mm x 0.25 mm), was developed for the separation of an amino acid mixture (glycine, asparic acid and lysine), followed by quadruple-pulse electrochemical detection. Nafion membrane contains hydrophilic pores (10-20 A and 50-60 A in size) acting as very narrow electrophoresis channels. The fixed-charge sites (-SO(3) (-)) on the hydrophilic pore surface provide a strong charged background. A platinum disk electrode (0.90 mm inner diameter) was employed as the detection electrode and the electrophoresis cathode was used as the quasi-reference and counter electrode for the end-column electrochemical detector, without decoupler. Under optimized conditions the mixture of amino acids could be separated at a voltage of only 90 V with a detection limit of 10(-7) M, indicating that Nafion membrane electrophoresis is a potentially attractive technique for the separation of small organic molecules or ions.
