Phase demodulation method of high line density grating interferometric signal based on wavelet transform.

The increasing line density of the reference grating and the accelerating miniaturization of ultra-precision displacement measurement technology necessitate more stable interferometric signal processing methods for high line density gratings, particularly in low signal-to-noise ratio scenarios. This paper presents a phase demodulation method for dynamic interferometric signals for high line density gratings. The Morlet wavelet transform is utilized to obtain the instantaneous frequency of the interferometric signal, integration of which yields the relative displacement, while adding adjacent relative displacements without gaps provides the absolute displacement during dynamic motion of the grating. In simulations with a signal-to-noise ratio ranging from 40 to 70 dB, the proposed method demonstrates greater robustness compared to the traditional method. By establishing a platform for repeated experiments and comparing it with traditional methods, it was found that the maximum deviation between calculation results obtained using this method and traditional methods is 0.8 nm, further confirming its potential application.

Improving grating duty cycle uniformity: amplitude-splitting flat-top beam laser interference lithography.

Laser interference lithography is an effective approach for grating fabrication. As a key parameter of the grating profile, the duty cycle determines the diffraction characteristics and is associated with the irradiance of the exposure beam. In this study, we developed a fabrication technique amplitude-splitting flat-top beam interference lithography to improve duty cycle uniformity. The relationship between the duty cycle uniformity and irradiance of the exposure beam is analyzed, and the results indicate that when the beam irradiance nonuniformity is less than 20%, the grating duty cycle nonuniformity is maintained below ±2%. Moreover, an experimental amplitude-splitting flat-top beam interference lithography system is developed to realize an incident beam irradiance nonuniformity of 21%. The full-aperture duty cycle nonuniformity of the fabricated grating is less than ±3%. Amplitude-splitting flat-top beam interference lithography improves duty cycle uniformity, greatly reduces energy loss compared to conventional apodization, and is more suitable for manufacturing highly uniform gratings over large areas.

Real-time synchronized monitoring for the overlap accuracy of the combining beam spot in a wavelength beam combination based on confocal planes.

Beam overlap accuracy in a wavelength beam combination system determines the beam quality and efficiency, so systematic monitoring of overlap accuracy is essential. In this work, a method of performing real-time synchronized monitoring and recording overlap accuracy for a combining beam spot is proposed. Firstly, theoretical calculations for monitoring different wavelength sub-beam positions and angular errors are established. Then, an optical design and grayscale centroid algorithm are developed to analyze and simulate the combination spots. A monitoring device was designed and constructed to meet the requirements of combining system applications, which achieved an accuracy of 8.86 µrad. Finally, the method successfully monitored the system spot fluctuation range within ±22 µrad. This study resolves the issue of distinguishing the different wavelength sub-beams and their response delays in traditional combining beams. It offers precise error data for real-time synchronized calibration of the overlap accuracy in laser beam combining technology.

Experimental study on chemical mechanical polishing of chalcogenide glasses.

Chalcogenide glasses (Ge10As40Se50) are one of the core components of the athermalized infrared optical system. Because of material properties, its processability is limited, and surface defects are difficult to control. The chemical nature of Ge10As40Se50 has been established, which can react with sodium hydroxide and hydrogen peroxide (H2O2). In this paper, experimental studies are further carried out to investigate the effect of chemical-mechanical polishing on the surface. As a result, both agents can improve the surface quality effectively. When the concentration of H2O2 is about 10 wt. % to 15 wt. %, the best result can be obtained, in which case the surface microdefect and surface roughness are significantly improved with the surface roughness RMS≈0.31 nm.