ABSTRACT
We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO2/SiO2/Si and Ti/SiO2/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity curves measured versus the incidence angle at different soft x-ray reflection (SXR) photon energies. The results were confirmed by the conventional techniques of hard x-ray photoelectron spectroscopy (HXPES) and high-resolution transmission electron microscopy (HRTEM). The depth variation of the chemical composition, thicknesses and densities of individual layers extracted from SXR and HXPES measurements are in close agreement and correlate well with the HRTEM images.
ABSTRACT
Chromium-scandium (Cr-Sc) is a promising material combination for multilayer mirrors in the water window region. A possible x-ray source for laboratory use in this wavelength range is the nitrogen K(alpha) line at 3.16 nm. High reflectivities at this wavelength can be achieved with Cr-Sc multilayer mirrors if the interfaces between adjacent layers are smooth. The growth parameters of the magnetron sputtering process for these materials have been optimized. It is shown that the reflectivity of such mirrors can be considerably improved by the application of a proper bias voltage during film growth. The high quality of the multilayer films is demonstrated with copper K(alpha) x-ray reflection and transmission electron microscopy. The reflective properties of the multilayers close to the nitrogen K(alpha) line were measured with synchrotron radiation for different angles of incidence. Reflectivities between R = 5.9% for near-normal incidence (theta = 1.5 degrees) and R = 29.6% for theta = 59.9 degrees were measured.
