Direct fabrication of high-quality vertical graphene nanowalls on arbitrary substrates without catalysts for tidal power generation.

The non-catalytic preparation of high-quality vertical graphene nanowalls (VGN) and graphene-based high output power hydrovoltaic effect power generation devices has always been difficult to achieve. In this work, we successfully prepared VGN with defect density, few layers and submicron domain size on a variety of substrates without catalysts through reasonable adjustment of growth conditions by the hot-wire chemical vapor deposition (HWCVD) method. The Raman test of the VGN prepared under optimal conditions showed that its ID/IG value was less than 1, and I2D/IG was more than 2.8. The deposition pressure was a key factor affecting the crystallization quality of the VGN. A suitable deposition pressure of 500 Pa could screen the active carbon clusters involved in the growth of nanowalls. The VGN prepared had excellent electrical properties and output of dropping-ion-droplet nano-power generation devices. Because of the larger crystal domain area and smaller contact angle of the VGN, the maximum output power exhibited at 100 Pa was 15.7 µW, which exceeded the value produced by other reported hydrovoltaic energy harvesting devices. All of them confirmed that VGN with improved quality had high application prospects in nano-energy devices.

Near Room-Temperature Synthesis of Vertical Graphene Nanowalls on Dielectrics.

Vertical graphene nanowalls (VGNs) with excellent heat-transfer properties are promising to be applied in the thermal management of electronic devices. However, high growth temperature makes VGNs unable to be directly prepared on semiconductors and polymers, which limits the practical application of VGNs. In this work, the near room-temperature growth of VGNs was realized by utilizing the hot filament chemical vapor deposition method. Catalytic tantalum (Ta) filaments promote the decomposition of acetylene at ∼1600 °C. Density functional theory calculations proved that C2H* was the main active carbon cluster during VGN growth. The restricted diffusion of C2H* clusters induced the vertical growth of graphene nanoflakes on various substrates below 150 °C. The direct growth of VGNs successfully realized the excellent interfacial contact, and the thermal contact resistance could reach 3.39 × 10-9 m2·K·W-1. The temperature of electronic chips had a 6.7 °C reduction by utilizing directly prepared VGNs instead of thermal conductive tape as thermal-interface materials, indicating the great potential of VGNs to be directly prepared on electronic devices for thermal management.