Simple way to fabricate orderly arranged nanostructure arrays on diamond utilizing metal dewetting effect.

We introduce a simple method with thermal annealing round gold disk for agglomeration to fabricate orderly arranged nanostructure arrays on diamond for single photon source applications. In the annealing process, the dependence of gold sphere size on disk thickness and diameter was investigated, showing that gold sphere diameter was decreased with decreasing gold disk thickness or diameter. The condition parameters of ICP etch were adjusted to obtain different nanostructure morphologies on diamond. The collection efficiency of nitrogen-vacancy (NV) center embedded in nanostructure as-fabricated could reach to 53.56% compared with that of 19.10% in planar case with the same simulation method.

Fabrication of Diamond Submicron Lenses and Cylinders by ICP Etching Technique with SiO2 Balls Mask.

Submicron lenses and cylinders exhibiting excellent properties in photodetector and quantum applications have been fabricated on a diamond surface by an inductively-coupled plasma (ICP) etching technique. During ICP etching, a layer containing 500 nm diameter balls of SiO2 was employed as mask. By changing the mixing ratio of O2, Ar and CF4 during ICP etching, several submicron structures were fabricated, such as cylinders and lenses. The simulation results demonstrated that such submicron structures on a diamond's surface can greatly enhance the photon out-coupling efficiency of embedded nitrogen-vacancy center.

Investigation of the occupancy ratio dependence for microlens arrays on diamond.

Diamond microlens arrays with a high occupancy ratio were fabricated by an improved thermal reflow method. Our resultes show that the occupancy ratio of a photoresist mask could be improved with optimizing the reflow temperature, time and photoresist thickness during the reflow process. The fabricated microlens arrays exhibited a uniform arrangement and good optical performance.

Fabrication of monolithic diamond photodetector with microlenses.

A monolithic diamond photodetector with microlenses is fabricated by etching microlens arrays (MLAs) on single crystal diamond surface and patterning tungsten electrode strips on the edge of these arrays. Firstly, compact MLAs are etched on half of diamond sample surface by thermal reflow method. Secondly, via magnetron sputtering technique, two sets of interdigitated tungsten electrodes are patterned on the sample surface, one set is on the edge of MLAs, the other set is on the planar area. The optoelectronic performances of photodetectors have been investigated and indicated that the photocurrent of microlens photodetector increases by 74.8 percent at 10 V under 220 nm UV light illumination by comparing with that in planar case. Simulations of photodetectors' electrical and optical properties have been carried out, illustrating an improvement of charge collection ability and light absorption efficiency in microlens case. Furthermore, the present device structure can be extended to other semiconductor photodetectors.

Fabrication of diamond microlenses by chemical reflow method.

We introduce a chemical reflow method to fabricate diamond microlenses. First, photoresist pillars developed by photolithography are reflowed in organic solvent vapor atmosphere at 20 °C to form spherical segment patterns on diamond substrate. The effects of chemical solvent type and reflow time on photoresist pattern profiles are investigated. Second, via dry etching, diamond microlenses are fabricated by transferring the spherical segment pattern into substrate. Furthermore, these diamond microlenses demonstrate low numerical aperture, well-controllable curvature, and good imaging performance with projecting experiment.