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Article in English | MEDLINE | ID: mdl-24995412

ABSTRACT

In this research, ZnO nanoparticle loaded on activated carbon (ZnO-NPs-AC) was synthesized simply by a low cost and nontoxic procedure. The characterization and identification have been completed by different techniques such as SEM and XRD analysis. A three layer artificial neural network (ANN) model is applicable for accurate prediction of dye removal percentage from aqueous solution by ZnO-NRs-AC following conduction of 270 experimental data. The network was trained using the obtained experimental data at optimum pH with different ZnO-NRs-AC amount (0.005-0.015 g) and 5-40 mg/L of sunset yellow dye over contact time of 0.5-30 min. The ANN model was applied for prediction of the removal percentage of present systems with Levenberg-Marquardt algorithm (LMA), a linear transfer function (purelin) at output layer and a tangent sigmoid transfer function (tansig) in the hidden layer with 6 neurons. The minimum mean squared error (MSE) of 0.0008 and coefficient of determination (R(2)) of 0.998 were found for prediction and modeling of SY removal. The influence of parameters including adsorbent amount, initial dye concentration, pH and contact time on sunset yellow (SY) removal percentage were investigated and optimal experimental conditions were ascertained. Optimal conditions were set as follows: pH, 2.0; 10 min contact time; an adsorbent dose of 0.015 g. Equilibrium data fitted truly with the Langmuir model with maximum adsorption capacity of 142.85 mg/g for 0.005 g adsorbent. The adsorption of sunset yellow followed the pseudo-second-order rate equation.


Subject(s)
Azo Compounds/chemistry , Nanotubes/chemistry , Neural Networks, Computer , Zinc Oxide/chemistry , Adsorption , Algorithms , Azo Compounds/isolation & purification , Charcoal/chemistry , Coloring Agents/chemistry , Coloring Agents/isolation & purification , Hydrogen-Ion Concentration , Kinetics , Microscopy, Electron, Scanning , Time Factors , Water Pollutants, Chemical/chemistry , Water Pollutants, Chemical/isolation & purification , X-Ray Diffraction
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