Semiconductor Work and the Risk of Spontaneous Abortion: A Systematic Review and Meta-Analysis.

(1) Background: In the semiconductor industry, female workers were identified as having an increased risk of spontaneous abortion (SA). To date, the association between semiconductor work and SA is controversial. We aimed to assess the association between semiconductor work and specific processes and SA, in the semiconductor industry. (2) Methods: A literature search was conducted using databases such as PubMed, Embase, Cochrane library, and other core databases, from the date of inception of these databases to 31 July 2019. Studies that identified SA risk in female workers in the semiconductor industry were included. (3) Results: We identified 529 studies, of which six studies were included in the meta-analysis. During 1980-1993, the risk of SA in fabrication (Fab) workers was significantly higher than non-Fab workers (RR, 1.29; 95% CI, 1.05-1.57). Photolithography workers had a higher SA risk than non-process and office workers (RR, 1.41; 95% CI, 1.13-1.77). (4) Conclusion: Meta-analysis indicates a statistically significant association between Fab-work and SA. Specific process and chemical exposure meta-analyses need to be interpreted carefully considering bias. Because of the rapid change in the semiconductor industry, it is necessary to conduct an elaborate cohort study taking into consideration the current working environment.

Comprehensive Evaluation of Hazardous Chemical Exposure Control System at a Semiconductor Manufacturing Company in South Korea.

The goal of this study was to evaluate the hazardous chemical exposure control system in a semiconductor manufacturing company and recommend an appropriate exposure surveillance system for hazardous agents. We reviewed compliance-based chemical exposure data compiled between 2012 and 2014 by the study company. The chemical management system, characteristics of chemical use and hazardous gas monitoring system were also investigated. We evaluated the airborne isopropyl alcohol (IPA) and acetone generally used as cleaning solvents, volatile organic compounds and metals levels using internationally recommended sampling and analytical methods. Based on the results of past working environment measurement data and of our investigation, the overall current exposure to chemicals by semiconductor workers during routine production work appears to be controlled below occupational exposure limits. About 40% of chemical products used were found to contain at least one unidentifiable trade-secret substance. There are several situations and maintenance tasks that need special attention to reduce exposure to carcinogens as much as possible. In addition, a job-exposure matrix as a tool of surveillance system that can examine the exposure and health status of semiconductor workers according to type of operation and type of job or task is recommended.

Assessment of a Monte-Carlo simulation of SPECT recordings from a new-generation heart-centric semiconductor camera: from point sources to human images.

Geant4 application for tomographic emission (GATE), a Monte-Carlo simulation platform, has previously been used for optimizing tomoscintigraphic images recorded with scintillation Anger cameras but not with the new-generation heart-centric cadmium-zinc-telluride (CZT) cameras. Using the GATE platform, this study aimed at simulating the SPECT recordings from one of these new CZT cameras and to assess this simulation by direct comparison between simulated and actual recorded data, ranging from point sources to human images. Geometry and movement of detectors, as well as their respective energy responses, were modeled for the CZT 'D.SPECT' camera in the GATE platform. Both simulated and actual recorded data were obtained from: (1) point and linear sources of (99m)Tc for compared assessments of detection sensitivity and spatial resolution, (2) a cardiac insert filled with a (99m)Tc solution for compared assessments of contrast-to-noise ratio and sharpness of myocardial borders and (3) in a patient with myocardial infarction using segmented cardiac magnetic resonance imaging images. Most of the data from the simulated images exhibited high concordance with the results of actual images with relative differences of only: (1) 0.5% for detection sensitivity, (2) 6.7% for spatial resolution, (3) 2.6% for contrast-to-noise ratio and 5.0% for sharpness index on the cardiac insert placed in a diffusing environment. There was also good concordance between actual and simulated gated-SPECT patient images for the delineation of the myocardial infarction area, although the quality of the simulated images was clearly superior with increases around 50% for both contrast-to-noise ratio and sharpness index. SPECT recordings from a new heart-centric CZT camera can be simulated with the GATE software with high concordance relative to the actual physical properties of this camera. These simulations may be conducted up to the stage of human SPECT-images even if further refinement is needed in this setting.

Identifying the hazard characteristics of powder byproducts generated from semiconductor fabrication processes.

Semiconductor manufacturing processes generate powder particles as byproducts which potentially could affect workers' health. The chemical composition, size, shape, and crystal structure of these powder particles were investigated by scanning electron microscopy equipped with an energy dispersive spectrometer, Fourier transform infrared spectrometry, and X-ray diffractometry. The powders generated in diffusion and chemical mechanical polishing processes were amorphous silica. The particles in the chemical vapor deposition (CVD) and etch processes were TiO(2) and Al(2)O(3), and Al(2)O(3) particles, respectively. As for metallization, WO(3), TiO(2), and Al(2)O(3) particles were generated from equipment used for tungsten and barrier metal (TiN) operations. In photolithography, the size and shape of the powder particles showed 1-10 µm and were of spherical shape. In addition, the powders generated from high-current and medium-current processes for ion implantation included arsenic (As), whereas the high-energy process did not include As. For all samples collected using a personal air sampler during preventive maintenance of process equipment, the mass concentrations of total airborne particles were < 1 µg, which is the detection limit of the microbalance. In addition, the mean mass concentrations of airborne PM10 (particles less than 10 µm in diameter) using direct-reading aerosol monitor by area sampling were between 0.00 and 0.02 µg/m(3). Although the exposure concentration of airborne particles during preventive maintenance is extremely low, it is necessary to make continuous improvements to the process and work environment, because the influence of chronic low-level exposure cannot be excluded.

[Hygienic aspects of the use of LED light sources for general illumination in schools].

For the time present becoming more common semiconductor sources of artificial lighting has become a more and more frequent practice. With the aim to study the impact of LEDs on the health of schoolchildren studies in experimental conditions (specially equipped classrooms) were performed. The comparative analysis of the state of vision, mental health and emotional state of pupils in primary, middle and high schools under fluorescent and LED lighting, meeting to the regulatory requirements, has revealed that the physiological cost of schooling in the use of LED units in classrooms is lower than in a traditional, fluorescent lighting.

A comprehensive review of arsenic levels in the semiconductor manufacturing industry.

This paper presents a summary of arsenic level statistics from air and wipe samples taken from studies conducted in fabrication operations. The main objectives of this study were not only to describe arsenic measurement data but also, through a literature review, to categorize fabrication workers in accordance with observed arsenic levels. All airborne arsenic measurements reported were included in the summary statistics for analysis of the measurement data. The arithmetic mean was estimated assuming a lognormal distribution from the geometric mean and the geometric standard deviation or the range. In addition, weighted arithmetic means (WAMs) were calculated based on the number of measurements reported for each mean. Analysis of variance (ANOVA) was employed to compare arsenic levels classified according to several categories such as the year, sampling type, location sampled, operation type, and cleaning technique. Nine papers were found reporting airborne arsenic measurement data from maintenance workers or maintenance areas in semiconductor chip-making plants. A total of 40 statistical summaries from seven articles were identified that represented a total of 423 airborne arsenic measurements. Arsenic exposure levels taken during normal operating activities in implantation operations (WAM = 1.6 µg m⁻³, no. of samples = 77, no. of statistical summaries = 2) were found to be lower than exposure levels of engineers who were involved in maintenance works (7.7 µg m⁻³, no. of samples = 181, no. of statistical summaries = 19). The highest level (WAM = 218.6 µg m⁻³) was associated with various maintenance works performed inside an ion implantation chamber. ANOVA revealed no significant differences in the WAM arsenic levels among the categorizations based on operation and sampling characteristics. Arsenic levels (56.4 µg m⁻³) recorded during maintenance works performed in dry conditions were found to be much higher than those from maintenance works in wet conditions (0.6 µg m⁻³). Arsenic levels from wipe samples in process areas after maintenance activities ranged from non-detectable to 146 µg cm⁻², indicating the potential for dispersion into the air and hence inhalation. We conclude that workers who are regularly or occasionally involved in maintenance work have higher potential for occupational exposure than other employees who are in charge of routine production work. In addition, fabrication workers can be classified into two groups based on the reviewed arsenic exposure levels: operators with potential for low levels of exposure and maintenance engineers with high levels of exposure. These classifications could be used as a basis for a qualitative ordinal ranking of exposure in an epidemiological study.

Current-driven atomic waterwheels.

A current induces forces on atoms inside the conductor that carries it. It is now possible to compute these forces from scratch, and to perform dynamical simulations of the atomic motion under current. One reason for this interest is that current can be a destructive force--it can cause atoms to migrate, resulting in damage and in the eventual failure of the conductor. But one can also ask, can current be made to do useful work on atoms? In particular, can an atomic-scale motor be driven by electrical current, as it can be by other mechanisms? For this to be possible, the current-induced forces on a suitable rotor must be non-conservative, so that net work can be done per revolution. Here we show that current-induced forces in atomic wires are not conservative and that they can be used, in principle, to drive an atomic-scale waterwheel.

An integrated CMOS bio-potential amplifier with a feed-forward DC cancellation topology.

This paper describes a novel technique to realize an integrated CMOS bio-potential amplifier with a feedforward DC cancellation topology. The amplifier is designed to provide substantial DC cancellation even while amplifying very low frequency signals. More than 80 dB offset rejection ratio is achieved without any external capacitors. The cancellation scheme is robust against process and temperature variations. The amplifier is fabricated through MOSIS AMI 1.5 microm technology (0.05 mm2 area). Measurement results show a gain of 43.5 dB in the pass band (<1 mHz-5 KHz), an input referred noise of 3.66 microVrms, and a current consumption of 22 microA.

Experimental factors controlling analyte ion generation in laser desorption/ionization mass spectrometry on porous silicon.

Desorption/ionization on porous silicon (DIOS) is a relatively new laser desorption/ionization technique for the direct mass spectrometric analysis of a wide variety of samples without the requirement of a matrix. Porous silicon substrates were fabricated using the recently developed nonelectrochemical H2O2-metal-HF etching as a versatile platform for investigating the effects of morphology and physical properties of porous silicon on DIOS-MS performance. In addition, laser wavelength, mode of ion detection, pH, and solvent contributions to the desorption/ionization process were studied. Other porous substrates such as GaAs and GaN, with similar surface characteristics but differing in thermal and optical properties from porous silicon, allowed the roles of surface area, optical absorption, and thermal conductivities in the desorption/ionization process to be investigated. Among the porous semiconductors studied, only porous silicon has the combination of large surface area, optical absorption, and thermal conductivity required for efficient analyte ion generation under the conditions studied. In addition to these substrate-related factors, surface wetting, determined by the interaction of deposition solvent with the surface, and charge state of the peptide were found to be important in determining ion generation efficiency.

A random coefficient degradation model with random sample size.

In testing product reliability, there is often a critical cutoff level that determines whether a specimen is classified as "failed." One consequence is that the number of degradation data collected varies from specimen to specimen. The information of random sample size should be included in the model, and our study shows that it can be influential in estimating model parameters. Two-stage least squares (LS) and maximum modified likelihood (MML) estimation, which both assume fixed sample sizes, are commonly used for estimating parameters in the repeated measurements models typically applied to degradation data. However, the LS estimate is not consistent in the case of random sample sizes. This article derives the likelihood for the random sample size model and suggests using maximum likelihood (ML) for parameter estimation. Our simulation studies show that ML estimates have smaller biases and variances compared to the LS and MML estimates. All estimation methods can be greatly improved if the number of specimens increases from 5 to 10. A data set from a semiconductor application is used to illustrate our methods.

A silicon bidirectional flow sensor for measuring respiratory flow.

We describe a solid-state, silicon integrated, bidirectional flow sensor for respiratory applications. The sensor is a thermal vector sensor. The electronic circuitry for obtaining bidirectional sensitivity is presented together with actual application to a healthy volunteer put on mechanical ventilation. The sensor's input flow range is from -60 to +60 L/min, and its rise-time is < or = 40 ms and fall-time is < or = 60 ms. The effect of changes in gas composition as used in mechanically ventilated patients on the sensor output signal are estimated to be less than 2%. The temperature sensitivity is about -1.5% per degree Celsius.