Protein micro- and nanopatterning using aminosilanes with protein-resistant photolabile protecting groups.

An approach to the integration of nanolithography with synthetic chemical methodology is described, in which near-field optical techniques are used to selectively deprotect films formed by the adsorption of aminosilanes protected by modified 2-nitrophenylethoxycarbonyl (NPEOC) groups. The NPEOC groups are functionalized at the m- or p-position with either a tetraethyleneglycol or a heptaethylene glycol adduct. We describe the synthesis of these bioresistant aminosilanes and the characterization of the resulting photoreactive films. Photodeprotection by exposure to UV light (λ = 325 nm) yielded the amine with high efficiency, at a similar rate for all four adsorbates, and was complete after an exposure of 2.24 J cm(-2). Following photodeprotection, derivatization by trifluoroacetic anhydride was carried out with high efficiency. Micropatterned samples, formed using a mask, were derivatized with aldehyde-functionalized polymer nanoparticles and, following derivatization with biotin, were used to form patterns of avidin-coated polymer particles. Fluorescence microscopy and atomic force microscopy data demonstrated that the intact protecting groups conferred excellent resistance to nonspecific adsorption. Nanometer-scale patterns were created using scanning near-field photolithography and were derivatized with biotin. Subsequent conjugation with avidin-functionalized polymer nanoparticles yielded clear fluorescence images that indicated dense attachment to the nanostructures and excellent protein resistance on the surrounding surface. These simple photocleavable protecting group strategies, combined with the use of near-field exposure, offer excellent prospects for the control of surface reactivity at nanometer resolution in biological systems and offer promise for integrating the top-down and bottom-up molecular fabrication paradigms.

Parallel scanning near-field photolithography: the snomipede.

The "Millipede", developed by Binnig and co-workers (Bining, G. K.; et al. IBM J. Res. Devel. 2000, 44, 323.), elegantly solves the problem of the serial nature of scanning probe lithography processes, by deploying massive parallelism. Here we fuse the "Millipede" concept with scanning near-field photolithography to yield a "Snomipede" that is capable of executing parallel chemical transformations at high resolution over macroscopic areas. Our prototype has sixteen probes that are separately controllable using a methodology that is, in principle, scalable to much larger arrays. Light beams generated by a spatial modulator or a zone plate array are coupled to arrays of cantilever probes with hollow, pyramidal tips. We demonstrate selective photodeprotection of nitrophenylpropyloxycarbonyl-protected aminosiloxane monolayers on silicon dioxide and subsequent growth of nanostructured polymer brushes by atom-transfer radical polymerization, and the fabrication of 70 nm structures in photoresist by a Snomipede probe array immersed under water. Such approaches offer a powerful means of integrating the top-down and bottom-up fabrication paradigms, facilitating the reactive processing of materials at nanometer resolution over macroscopic areas.

Micrometer- and nanometer-scale photopatterning using 2-nitrophenylpropyloxycarbonyl-protected aminosiloxane monolayers.

An approach to nanopatterning is reported in which a scanning near-field optical microscope coupled to a near-UV laser is used to selectively deprotect 2-nitrophenylpropyloxycarbonyl (NPPOC)-protected aminosiloxane monolayers on glass. UV deprotection was studied for unpatterned samples using X-ray photoelectron spectroscopy (XPS) and contact angle measurements. Highly efficient photodeprotection of the NPPOC moiety was observed upon irradiation at both 325 and 364 nm, and complete deprotection was found to occur within minutes. The resulting amine-terminated surfaces were then derivatized using trifluoroacetic anhydride (TFAA) and aldehyde-functionalized polymer nanoparticles. Contact angle and XPS measurements postderivatization indicated that surface functionalization was extensive, with the NPPOC-deprotected surfaces and aminopropylsiloxane control materials exhibiting essentially identical characteristics. Micrometer-scale patterns were fabricated using mask-based exposure, functionalized with polymer nanoparticles, and characterized by atomic force microscopy. Nanometer-scale patterns were fabricated using near-field exposure and characterized by friction force microscopy. The nanopatterns were derivatized with TFAA. The resulting images exhibited a clear contrast inversion that was due to an inversion of surface polarity in the patterned areas and confirmed that high spatial resolution (ca. 100 nm) was readily achievable.