Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.

Block copolymers demonstrate potential for use in next-generation lithography due to their ability to self-assemble into well-ordered periodic arrays on the 3-100 nm length scale. The successful lithographic application of block copolymers relies on three critical conditions being met: high Flory-Huggins interaction parameters (χ), which enable formation of <10 nm features, etch selectivity between blocks for facile pattern transfer, and thin film self-assembly control. The present paper describes the synthesis and self-assembly of block copolymers composed of naturally derived oligosaccharides coupled to a silicon-containing polystyrene derivative synthesized by activators regenerated by electron transfer atom transfer radical polymerization. The block copolymers have a large χ and a low degree of polymerization (N) enabling formation of 5 nm feature diameters, incorporate silicon in one block for oxygen reactive ion etch contrast, and exhibit bulk and thin film self-assembly of hexagonally packed cylinders facilitated by a combination of spin coating and solvent annealing techniques. As observed by small angle X-ray scattering and atomic force microscopy, these materials exhibit some of the smallest block copolymer features in the bulk and in thin films reported to date.

Fluorinated colloidal emulsion of photochangeable rheological behavior as a sacrificial agent to fabricate organic, three-dimensional microstructures.

Three-dimensional organic microfabrication, an emerging technology, faces the challenge of lacking a sacrificial agent (SA) to temporarily support the formation of microscale geometries, which can be removed after a microstructure is constructed. In this study, an ultradense oil-in-organofluorine colloidal emulsion with photopolymerizable submicrometer droplets (diameter approximately 500 nm) was prepared and used as the required SA. Upon exposure to light, the colloidal emulsion undergoes a significant rheological change, which hardens the emulsion and presents the molding/protecting function that an SA must have. Importantly, the emulsion includes a synthesized fluorophilic/fluorophobic block copolymer surfactant to stabilize the droplet compartments, facilitating the dissolution of the postexposure SA. Two successfully built, complex, organic 3D microstructures show the effectiveness of using this novel SA material.