A Simple Approach to Achieving Ultrasmall III-Nitride Microlight-Emitting Diodes with Red Emission.

The microdisplays for augmented reality and virtual reality require ultrasmall micro light-emitting-diodes (µLEDs) with a dimension of ≤5 µm. Furthermore, the microdisplays also need three kinds of such µLEDs each emitting red, green, and blue emission. Currently, in addition to a great challenge for achieving ultrasmall µLEDs mainly based on III-nitride semiconductors, another fundamental barrier is due to an extreme difficulty in growing III-nitride-based red LEDs. So far, there has not been any effective approach to obtain high indium content InGaN as an active region required for a red LED while maintaining high optical performance. In this paper, we have demonstrated a selective epitaxy growth approach using a template featuring microhole arrays. This allows us to not only obtain the natural formation of ultrasmall µLEDs but also achieve InGaN with enhanced indium content at an elevated growth temperature, at which it is impossible to obtain InGaN-based red LEDs on a standard planar surface. By means of this approach, we have demonstrated red µLEDs (at an emission wavelength of 642 nm) with a dimension of 2 µm, exhibiting a high luminance of 3.5 × 107 cd/m2 and a peak external quantum efficiency of 1.75% measured in a wafer form (i.e., without any packaging to enhance an extraction efficiency). In contrast, an LED grown under identical growth conditions but on a standard planar surface shows green emission at 538 nm. This highlights that our approach provides a simple solution that can address the two major challenges mentioned above.

Simple Approach to Mitigate the Emission Wavelength Instability of III-Nitride µLED Arrays.

III-nitride semiconductors and their heterojunctions exhibit intrinsic polarization due to the asymmetry of their wurtzite structure, which determines all the fundamental properties of III-nitride optoelectronics. The intrinsic polarization-induced quantum-confined Stark effect leads to an emission wavelength shift with increasing injection current for III-nitride visible LEDs, forming an insurmountable barrier for the fabrication of a full color display. For instance, a yellow LED designed to produce yellow light emits green or blue light at an elevated current, while a green (blue) LED gives off blue (violet) light with increasing current. This color instability becomes a serious issue for a microdisplay such as the displays for augmented reality (AR)/virtual reality (VR) typically utilized at proximity to the eye, where human eyes are sensitive to a tiny change in light color. It is well-known that an optical mode wavelength for a microcavity is insensitive to injection current. In this work, we have demonstrated an approach to epitaxially integrating microLEDs (green microLEDs as an example, one of the key components for a full color microdisplay) and a microcavity. This allows the emission from the microLEDs to be coupled with the microcavity, leading to a negligible emission wavelength shift with increasing injection current. In contrast, identical microLEDs but without a microcavity show a large emission wavelength shift from 560 nm down to 510 nm, measured under identical conditions. This approach provides a simple solution to resolving the 30-year issue in the field of III-nitride optoelectronics.

Nearly Lattice-Matched GaN Distributed Bragg Reflectors with Enhanced Performance.

Heavy silicon-doping in GaN generally causes a rough surface and saturated conductivity, while heavily silicon-doped n++-AlGaN with ≤5% aluminum can maintain an atomically flat surface and exhibit enhanced conductivity. Given this major advantage, we propose using multiple pairs of heavily silicon-doped n++-Al0.01Ga0.99N and undoped GaN instead of widely used multiple pairs of heavily silicon-doped n++-GaN and undoped GaN for the fabrication of a lattice-matched distributed Bragg reflector (DBR) by using an electrochemical (EC) etching technique, where the lattice mismatch between Al0.01Ga0.99N and GaN can be safely ignored. By means of using the EC etching technique, the n++-layers can be converted into nanoporous (NP) layers whilst the undoped GaN remains intact, leading to a significantly high contrast in refractive index between NP-layer and undoped GaN and thus forming a DBR. Our work demonstrates that the NP-Al0.01Ga0.99N/undoped GaN-based DBR exhibits a much smoother surface, enhanced reflectivity and a wider stopband than the NP-GaN/undoped GaN-based DBR. Furthermore, the NP-Al0.01Ga0.99N/undoped GaN-based DBR sample with a large size (up to 1 mm in width) can be obtained, while a standard NP-GaN/undoped GaN-based DBR sample obtained is typically on a scale of a few 100 µm in width. Finally, a series of DBR structures with high performance, ranging from blue to dark yellow, was demonstrated by using multiple pairs of n++-Al0.01Ga0.99N and undoped GaN.