RESUMEN
Epitaxial growth is a fundamental step required to create devices for the semiconductor industry, enabling different materials to be combined in layers with precise control of strain and defect structure. Patterning the growth substrate with a mask before performing epitaxial growth offers additional degrees of freedom to engineer the structure and hence function of the semiconductor device. Here, we demonstrate that conditions exist where such epitaxial lateral overgrowth can produce complex, three-dimensional structures that incorporate cavities of deterministic size. We grow germanium on silicon substrates patterned with a dielectric mask and show that fully-enclosed cavities can be created through an unexpected self-assembly process that is controlled by surface diffusion and surface energy minimization. The result is confined cavities enclosed by single crystalline Ge, with size and position tunable through the initial mask pattern. We present a model to account for the observed cavity symmetry, pinch-off and subsequent evolution, reflecting the dominant role of surface energy. Since dielectric mask patterning and epitaxial growth are compatible with conventional device processing steps, we suggest that this mechanism provides a strategy for developing electronic and photonic functionalities.
RESUMEN
Ion trapping has been found to be responsible for the performance degradation in electrochromic oxide thin films, and a detrapping procedure was proved to be effective to rejuvenate the degraded films. Despite of the studies on ion trapping and detrapping, its dynamics remain largely unknown. Moreover, coloration mechanisms of electrochromic oxides are also far from clear, limiting the development of superior devices. Here, we visualize ion trapping and detrapping dynamics in a model electrochromic material, amorphous WO3. Specifically, formation of orthorhombic Li2WO4 during long-term cycling accounts for the origin of shallow traps. Deep traps are multiple-step-determined, composed of mixed W4+-Li2WO4, amorphous Li2WO4 and W4+-Li2O. The non-decomposable W4+-Li2WO4 couple is the origin of the irreversible traps. Furthermore, we demonstrate that, besides the typical small polaron hopping between W5+ â W6+ sites, bipolaron hopping between W4+ â W6+ sites gives rise to optical absorption in the short-wavelength region. Overall, we provide a general picture of electrochromism based on polaron hopping. Ion trapping and detrapping were demonstrated to also prevail in other cathodic electrochromic oxides. This work not only provides the ion trapping and detrapping dynamics of WO3, but also open avenues to study other cathodic electrochromic oxides and develop superior electrochromic devices with great durability.
RESUMEN
Acoustic deformation potential (ADP) plays a significant role in quantifying carrier-acoustic phonon interactions in semiconductors. In this work, we report a novel ultrafast spectroscopy method to extract the ADP coupling constant of a semiconductor by jointly analyzing the coherent acoustic phonon signals with and without a metal transducer. By applying this method to GaAs, the ADP coupling constant corresponding to the band gap was extracted using a pump photon energy near the band gap, which agrees well with literature values. With a larger pump photon energy, the ADP coupling constant deviates from the one for the band gap, which is attributed to contributions from the carrier dynamics in multiple energy and wavevector states.
RESUMEN
Low-defect density Ge thin films are crucial for studying the impact of defect density on the performance limits of Ge-based optical devices (optical detectors, LEDs, and lasers). Ge thinning is also important for Ge-based multijunction solar cells. In this work, Ge wet etching using three acidic H2O2 solutions (HF, HCl, and H2SO4) was studied in terms of etching rate, surface morphology, and surface roughness. HCl-H2O2-H2O (1:1:5) was demonstrated to wet-etch 535 µm-thick bulk-Ge substrates to 4.1 µm with a corresponding RMS surface roughness of 10 nm, which was the thinnest Ge film from bulk-Ge via a wet etching method to the best of our knowledge. The good quality of pre-etched bulk-Ge was preserved, and the low threading dislocation density of 6000-7000 cm-2 was maintained after the etching process. This approach provides an inexpensive and convenient way for accurate Ge substrate thinning in applications such as multijunction solar cells and sub-10 µm-thick Ge thin film preparation, which enables future studies of low-defect density Ge-based devices such as photodetectors, LEDs, and lasers.
RESUMEN
Transient grating spectroscopy (TGS) based on diffraction gratings is a powerful optical method for studying the transport of energy carriers such as phonons and electrons. The diffraction grating in a TGS system is a key component to form a large-area interference pattern, i.e., transient grating, and to study the mean free path distribution of energy carriers. In this work, a design method for polarization-insensitive diffraction gratings with periods in the range 2-50 µm for TGS by a combination of rigorous coupled wave analysis and genetic algorithm was discussed. The method was tested for pump/probe wavelength of 515/532 or 1030/808 nm. Each ±1st diffraction order carries 35%-40% of the incident energy and the diffraction efficiencies of the other orders are lower than 10%. The optimized diffraction gratings were fabricated by a combination of photolithography and inductively coupled plasma etching, with the processing parameters introduced in detail, and their optical characteristics were evaluated. Finally, as a demonstration, the diffraction gratings for 1030/808 nm were applied to TGS to study the thermal transport properties of Ge. This work provides a useful guide for future applications and the development of TGS.
RESUMEN
Epitaxial lateral overgrowth (ELO) over a free-standing dielectric mask is an unexplored territory in selective epitaxy growth (SEG) of semiconductors. By shrinking the dielectric mask dimension to the micron scale, the growth fronts from ELO are able to converge and coalesce, thus providing the freedom to engineer the interfacial structure between the epi-layer and dielectric mask. We demonstrate, herein, anomalous adatom diffusion and migration at the Ge/SiO2 interface upon SEG on a Si (100) wafer. We find, depending on the oxide strip length, a polyhedral cavity or tunnel can form on the oxide layer. More importantly, we observe a thermally induced substantial internal surface reconfiguration process of Ge atoms that connects two tunnels and one cavity in order to form a single tunnel. Defect-free Ge above the oxide strips is obtained after coalescence. Our findings yield new insight into adatom migration in an enclosed space, and the cavity and tunnel show the first known three-dimensional geometric configuration in selective heteroepitaxial structures.
RESUMEN
Electrochromic (EC) smart windows are able to decrease our energy footprint while enhancing indoor comfort and convenience. However, the limited durability of these windows, as well as their cost, result in hampered market introduction. Here, we investigate thin films of the most widely studied EC material, WO3. Specifically, we combine optical measurements (using spectrophotometry in conjunction with variable-angle spectroscopic ellipsometry) with time-of-flight secondary ion mass spectrometry and atomic force microscopy. Data were taken on films in their as-deposited state, after immersion in a Li-ion-conducting electrolyte, after severe degradation by harsh voltammetric cycling and after galvanostatic rejuvenation to regain the original EC performance. Unambiguous evidence was found for the trapping and detrapping of Li ions in the films, along with a thickness increase or decrease during degradation and rejuvenation, respectively. It was discovered that (i) the trapped ions exhibited a depth gradient; (ii) following the rejuvenation procedure, a small fraction of the Li ions remained trapped in the film and gave rise to a weak short-wavelength residual absorption; and (iii) the surface roughness of the film was larger in the degraded state than in its virgin and rejuvenated states. These data provide important insights into the degradation mechanisms of EC devices and into means of achieving improved durability.
RESUMEN
Degradation of electrochromic thin films under extended charge insertion and extraction is a technically important phenomenon for which no in-depth understanding is currently on hand. Here, we report on an explorative study of sputter-deposited WO3 films in a Li-ion-conducting electrolyte by use of cyclic voltammetry, in situ optical transmittance, and impedance spectroscopy. A cycling-dependent decrease of the charge capacity could be accurately modeled by a power-law function, and impedance spectroscopy gave evidence for anomalous diffusion as well as a higher charge-transfer resistance during deintercalation than during intercalation. Thus, a consistent conceptual picture emerged for the degradation dynamics; it includes the growth of an interfacial barrier layer and also embraces anomalous diffusion coupled with dispersive power-law chemical kinetics.
RESUMEN
The quest for superior and low-cost electrochromic (EC) thin films, for applications in smart windows, remains strong because of their large importance for energy-efficient buildings. Although the development of new EC materials for improved devices is important, diminishing or reversing degradation is another key issue, and electrical rejuvenation of degraded EC materials can offer new opportunities. Here we demonstrate that cathodically coloring EC thin films of TiO2, which normally suffer from ion-trapping-induced degradation of charge capacity and optical modulation upon extensive electrochemical cycling, can recover their initial EC performance by a rejuvenation procedure involving Li(+) ion detrapping. Thus, the initial performance can be regained, and refreshed TiO2 films exhibit the same degradation features as as-deposited films upon prolonged electrochemical cycling. The rejuvenation was carried out by using either galvanostatic or potentiostatic treatments. Our study may open avenues to explore the recovery not only of EC materials and devices based on those but also for other ion-exchange-based devices.
RESUMEN
Ion trapping under charge insertion-extraction is well-known to degrade the electrochemical performance of oxides. Galvanostatic treatment was recently shown capable to rejuvenate the oxide, but the detailed mechanism remained uncertain. Here we report on amorphous electrochromic (EC) WO3 thin films prepared by sputtering and electrochemically cycled in a lithium-containing electrolyte under conditions leading to severe loss of charge exchange capacity and optical modulation span. Time-of-flight elastic recoil detection analysis (ToF-ERDA) documented pronounced Li(+) trapping associated with the degradation of the EC properties and, importantly, that Li(+) detrapping, caused by a weak constant current drawn through the film for some time, could recover the original EC performance. Thus, ToF-ERDA provided direct and unambiguous evidence for Li(+) detrapping.
RESUMEN
Devices relying on ion transport normally suffer from a decline of their long-term performance due to irreversible ion accumulation in the host material, and this effect may severely curtail the operational lifetime of the device. In this work, we demonstrate that degraded electrochromic WO3 films can sustainably regain their initial performance through galvanostatic detrapping of Li(+) ions. The rejuvenated films displayed degradation features similar to those of the as-prepared films, thus indicating that the detrapping process is effectively reversible so that long-term performance degradation can be successfully avoided. Detrapping did not occur in the absence of an electric current.
RESUMEN
There is keen interest in the use of amorphous WO3 thin films as cathodic electrodes in transmittance-modulating electrochromic devices. However, these films suffer from ion-trapping-induced degradation of optical modulation and reversibility on extended Li(+)-ion exchange. Here, we demonstrate that ion-trapping-induced degradation, which is commonly believed to be irreversible, can be successfully eliminated by constant-current-driven de-trapping; that is, WO3 films can be rejuvenated and regain their initial highly reversible electrochromic performance. Pronounced ion trapping occurs when x exceeds â¼0.65 in LixWO3 during ion insertion. We find two main kinds of Li(+)-ion-trapping site (intermediate and deep) in WO3, where the intermediate ones are most prevalent. Li(+) ions can be completely removed from intermediate traps but are irreversibly bound in deep traps. Our results provide a general framework for developing and designing superior electrochromic materials and devices.
RESUMEN
Anodically colored nickel oxide (NiO) thin films are of much interest as counter electrodes in tungsten oxide based electrochromic devices such as "smart windows" for energy-efficient buildings. However, NiO films are prone to suffering severe charge density degradation upon prolonged electrochemical cycling, which can lead to insufficient device lifetime. Therefore, a means to improve the durability of NiO-based films is an important challenge at present. Here we report that the incorporation of a modest amount of iridium into NiO films [Ir/(Ir + Ni) = 7.6 atom %] leads to remarkable durability, exceeding 10000 cycles in a lithium-conducting electrolyte, along with significantly improved optical modulation during extended cycling. Structure characterization showed that the face-centered-cubic-type NiO structure remained after iridium addition. Moreover, the crystallinity of these films was enhanced upon electrochemical cycling.